SCHEMBL5360193

SCHEMBL5360193

CCCCOC(=O)OC1(C)CC2C=CC1C2

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.35
CYP2C19 P33261 3/20 0.35
CYP2D6 P10635 2/20 0.35
ALDH1A1 P00352 1/20 0.34
ATM Q13315 1/20 0.33
EPHX2 P34913 5/20 0.32
TSHR P16473 4/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
HPGD P15428 2/20 0.31
LMNA P02545 2/20 0.31
ESR1 P03372 2/20 0.31
CYP1A2 P05177 2/20 0.31
MAPK1 P28482 1/20 0.31
NR1H2 P55055 1/20 0.31
RNASEL Q05823 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
RECQL P46063 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2C9 P11712 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5354586 0.92 CYP2D6 (0.36) CYP2C19CYP2D6ALDH1A1ATML3MBTL1
SCHEMBL5357706 0.86 CYP2D6 (0.38) CYP2C19CYP2D6ALDH1A1LMNA
SCHEMBL5366311 0.80 CYP2D6 (0.34) ELANECYP2C19CYP2D6ALDH1A1ATM
SCHEMBL5347779 0.78 CYP2D6 (0.34) CYP2C19CYP2D6
SCHEMBL200578 0.78 CYP2C19 (0.36) CYP2C19CYP2D6ALDH1A1ATMEPHX2
SCHEMBL6744508 0.77 CYP2D6 (0.38) CYP2C19CYP2D6ALDH1A1
SCHEMBL31695291 0.77 CYP2D6 (0.40) CYP2C19CYP2D6LMNA
SCHEMBL7204575 0.76 CYP2C19 (0.37) CYP2C19CYP2D6ALDH1A1ATMEPHX2
SCHEMBL7863152 0.75 CYP2D6 (0.36) CYP2C19CYP2D6
SCHEMBL32689139 0.74 EPHX2 (0.38) CYP2C19CYP2D6ALDH1A1EPHX2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed