Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | FAAH | O00519 | 5/20 | 0.36 |
| ▸ | GPR84 | Q9NQS5 | 5/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.34 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 1/20 | 0.33 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.33 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.33 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | LAP3 | P28838 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5349827 | 1.00 | TSHR (0.45) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL9586384 | 1.00 | TSHR (0.45) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL9586598 | 1.00 | TSHR (0.45) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL5362557 | 1.00 | TSHR (0.45) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL5360012 | 0.98 | TSHR (0.42) | TSHRMAPTFAAHGPR84FFAR1 | |
| SCHEMBL5360818 | 0.94 | TSHR (0.40) | TSHR | |
| SCHEMBL4612822 | 0.88 | ALDH1A1 (0.36) | TSHR | |
| SCHEMBL27842087 | 0.86 | NOS2 (0.31) | TSHR | |
| SCHEMBL5161744 | 0.82 | TSHR (0.31) | TSHR | |
| SCHEMBL1850276 | 0.81 | TSHR (0.34) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7282323-B2 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2007-10-16 | — | — | US | disclosed |
| US-20050244739-A1 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1536286-A1 | HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-5847071-A | Photosensitive resin composition | HITACHI, CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5668248-A | POLYAMIC ACID ESTERS | HITACHI CHEMICAL CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| US-5472823-A | Polyamic acids | HITACHI CHEMICAL CO., LTD. (JP) | 1995-12-05 | — | — | US | disclosed |
| EP-0373952-B1 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL CO LTD (JP) | 1995-02-08 | — | — | EP | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |