Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5412510 | 0.98 | THRB (0.35) | THRB | |
| SCHEMBL4340451 | 0.98 | THRB (0.35) | THRB | |
| SCHEMBL450274 | 0.94 | TET2 (0.31) | TET2 | |
| SCHEMBL561206 | 0.85 | TET2 (0.33) | TET2 | |
| SCHEMBL3850818 | 0.82 | THRB (0.31) | THRB | |
| SCHEMBL10657421 | 0.80 | TET2 (0.32) | TET2 | |
| SCHEMBL4340463 | 0.80 | THRB (0.34) | THRB | |
| SCHEMBL6028244 | 0.79 | THRB (0.33) | THRB | |
| SCHEMBL709099 | 0.79 | THRB (0.33) | THRB | |
| SCHEMBL1754858 | 0.79 | THRB (0.33) | THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0835294-B1 | LIGHT DIFFUSING ADHESIVE | MINNESOTA MINING & MFG (US) | 2003-01-29 | — | — | EP | claimed |
| CN-118119480-A | Method and apparatus for in-situ monitoring of chemical mechanical planarization CMP process | 崇硕科技公司 | 2024-05-31 | — | — | CN | disclosed |
| EP-4355528-A2 | METHOD AND APPARATUS FOR IN-SITU MONITORING OF CHEMICAL MECHANICAL PLANARIZATION (CMP) PROCESSES | Axus Technology, LLC (US) | 2024-04-24 | — | — | EP | disclosed |
| WO-2022265967-A2 | METHOD AND APPARATUS FOR IN-SITU MONITORING OF CHEMICAL MECHANICAL PLANARIZATION (CMP) PROCESSES | AXUS TECHNOLOGY, LLC (US) | 2022-12-22 | — | — | WO | disclosed |
| US-20220395956-A1 | METHOD AND APPARATUS FOR IN-SITU MONITORING OF CHEMICAL MECHANICAL PLANARIZATION (CMP) PROCESSES | AXUS TECHNOLOGY, LLC | 2022-12-15 | — | — | US | disclosed |
| US-7198544-B2 | Polishing pad with window | APPLIED MATERIALS, INC. (US) | 2007-04-03 | — | — | US | disclosed |
| US-6994607-B2 | Polishing pad with window | APPLIED MATERIALS, INC. (US) | 2006-02-07 | — | — | US | disclosed |
| US-20050266771-A1 | Polishing pad with window | APPLIED MATERIALS, INC., A DELAWARE CORPORATION | 2005-12-01 | — | — | US | disclosed |
| US-20040082271-A1 | Polishing pad with window | APPLIED MATERIALS, INC. | 2004-04-29 | — | — | US | disclosed |
| US-6716085-B2 | OPTICAL MONITORING SYSTEM AND A COMPUTER THAT ANALYZES A SIGNAL FROM THE DETECTOR AND CALCULATES WHETHER THE ENDPOINT HAS BEEN DETECTED | APPLIED MATERIALS INC. | 2004-04-06 | — | — | US | disclosed |
| US-20040033758-A1 | Polishing pad with window | APPLIED MATERIALS, INC. | 2004-02-19 | — | — | US | disclosed |
| WO-2004014603-A2 | POLISHING PAD WITH WINDOW | APPLIED MATERIALS, INC. (US) | 2004-02-19 | — | — | WO | disclosed |