Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.77 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.59 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.59 |
| ▸ | DPP4 | P27487 | 1/20 | 0.58 |
| ▸ | CSNK2A1 | P68400 | 2/20 | 0.57 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.48 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.48 |
| ▸ | SGK1 | O00141 | 1/20 | 0.47 |
| ▸ | MAOB | P27338 | 2/20 | 0.47 |
| ▸ | LTA4H | P09960 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | IDO1 | P14902 | 1/20 | 0.45 |
| ▸ | AGXT | P21549 | 1/20 | 0.45 |
| ▸ | BACE1 | P56817 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL27541593 | 0.98 | TAAR1 (0.74) | TAAR1LOXL2HRH3DPP4CSNK2A1 | |
| SCHEMBL28089504 | 0.95 | TAAR1 (0.68) | TAAR1LOXL2HRH3DPP4CSNK2A1 | |
| Hydrogen Sulfide SCHEMBL27625603 | 0.90 | TAAR1 (0.63) | TAAR1LOXL2HRH3DPP4CSNK2A1 | |
| SCHEMBL27661119 | 0.89 | TAAR1 (0.68) | TAAR1LOXL2HRH3DPP4CSNK2A1 | |
| SCHEMBL28281371 | 0.89 | TAAR1 (0.68) | TAAR1LOXL2HRH3DPP4CSNK2A1 | |
| Toluene SCHEMBL28751230 | 0.88 | TAAR1 (0.61) | TAAR1LOXL2HRH3DPP4CSNK2A1 | |
| SCHEMBL131842 | 0.87 | TAAR1 (1.00) | TAAR1LOXL2HRH3CSNK2A1CYP2A6 | |
| SCHEMBL22291708 | 0.87 | TAAR1 (1.00) | TAAR1LOXL2HRH3CSNK2A1CYP2A6 | |
| SCHEMBL22202237 | 0.87 | TAAR1 (1.00) | TAAR1LOXL2HRH3CSNK2A1CYP2A6 | |
| SCHEMBL28208288 | 0.87 | TAAR1 (1.00) | TAAR1LOXL2HRH3CSNK2A1CYP2A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1997939-B | Method of forming resist pattern, positive resist composition, and layered product | TOKYO OHKA KOGYO CO LTD | 2011-03-30 | — | — | CN | claimed |
| CN-108011053-A | A kind of preparation method of organic EL display panel | 江西沃格光电股份有限公司 | 2018-05-08 | — | — | CN | disclosed |
| CN-102161622-B | Compound provided with phenol substituent, method for preparing the compound, and resist composition containing the compound | KUMHO PETROCHEMICAL CO LTD | 2014-11-26 | — | — | CN | disclosed |
| CN-102161622-A | Compound provided with phenol substituent, method for preparing the compound, and resist composition containing the compound | KUMHO PETROCHEMICAL CO LTD | 2011-08-24 | — | — | CN | disclosed |
| CN-1997939-B | Method of forming resist pattern, positive resist composition, and layered product | TOKYO OHKA KOGYO CO LTD | 2011-03-30 | — | — | CN | disclosed |
| CN-101770173-A | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO | 2010-07-07 | — | — | CN | disclosed |
| EP-1575964-B1 | N-(BENZYL)AMINOALKYL CARBOXYLATE, PHOSPHINATES, PHOSPHONATES AND TETRAZOLES AS EDG RECEPTOR AGONISTS | MERCK & CO INC (US) | 2009-11-11 | — | — | EP | disclosed |
| CN-100410810-C | Plus photoresist composition and resist pattern forming method | TOKYO OHKA KOGYO CO LTD (JP) | 2008-08-13 | — | — | CN | disclosed |
| CN-101168509-A | Polyatomic phenol compound and chemical amplification type photoresist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2008-04-30 | — | — | CN | disclosed |
| CN-100381421-C | Process for producing triarylsulfonium salt | WAKO PURE CHEM IND LTD (JP) | 2008-04-16 | — | — | CN | disclosed |
| US-20060030736-A1 | Method for producing aromatic amino compound | IDEMITSU KOSAN CO., LTD. (JP) | 2006-02-09 | — | — | US | disclosed |
| CN-1208687-C | High-resolution photosnesiitve resin composition usable with I-line and method of forming patter | AZ ELECTRONIC MATERIALS JAPAN (JP) | 2005-06-29 | — | — | CN | disclosed |
| CN-1573552-A | Plus photoresist composition and resist pattern forming method | TOKYO OHKA KOGYO CO LTD (JP) | 2005-02-02 | — | — | CN | disclosed |
| CN-1170204-C | Radiation-sensitive resin composition | �������ؽ��ڣ�BVI������˾ | 2004-10-06 | — | — | CN | disclosed |
| CN-1169021-C | Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition | 克拉瑞特金融(BVI)有限公司 | 2004-09-29 | — | — | CN | disclosed |
| CN-1518685-A | Method for forming thick resist pattern | ���Ͽع�����˾ | 2004-08-04 | — | — | CN | disclosed |
| US-20040082813-A1 | Method for producting aromatic amino compound | IDEMITSU KOSAN CO., LTD. (JP) | 2004-04-29 | — | — | US | disclosed |
| CN-1401096-A | High resolution photosensitive resin composition for i-line and method of forming pattern | CLARIANT INT LTD (CH) | 2003-03-05 | — | — | CN | disclosed |
| CN-1313962-A | Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition | CLARIANT INT LTD (CH) | 2001-09-19 | — | — | CN | disclosed |
| CN-1294703-A | Photosensitive resin compsn. | CLARIANT INT LTD (CH) | 2001-05-09 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060030736-A1 | Method for producing aromatic amino compound | SLC7A1, SLC43A1, AHR | TAAR1 74/4885LOXL2 2494/4885HRH3 34/4885 |
| US-20040082813-A1 | Method for producting aromatic amino compound | ADRM1, SLC7A1, AHR | TAAR1 31/4885LOXL2 2639/4885HRH3 70/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.