SCHEMBL5368065

SCHEMBL5368065

c1ccc2cc(OC3CCCCC3)ccc2c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 1/20 0.50
EPHX1 P07099 1/20 0.50
ABL1 P00519 2/20 0.49
PDK2 Q15119 3/20 0.48
L3MBTL1 Q9Y468 1/20 0.47
MTNR1A P48039 1/20 0.47
MAOB P27338 1/20 0.47
IKBKB O14920 1/20 0.46
DDB1 Q16531 1/20 0.46
CRBN Q96SW2 1/20 0.46
CYP1A2 P05177 1/20 0.45
CYP2A6 P11509 1/20 0.45
MCHR1 Q99705 2/20 0.44
ROCK1 Q13464 1/20 0.43
FPR2 P25090 2/20 0.43
PROKR1 Q8TCW9 2/20 0.43
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
HTR3A P46098 1/20 0.42
KCNH2 Q12809 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30477858 0.90 CYP1A2 (0.50) FAAHEPHX1L3MBTL1IKBKBDDB1
SCHEMBL16902878 0.90 CYP1A2 (0.50) FAAHEPHX1L3MBTL1IKBKBDDB1
SCHEMBL11063126 0.81 IKBKB (0.68) IKBKBDDB1CRBNROCK1SLC6A2
SCHEMBL15566046 0.81 CYP1A2 (0.47) L3MBTL1IKBKBDDB1CRBNCYP1A2
SCHEMBL12431902 0.81 MAOB (0.52) ABL1PDK2MTNR1AMAOBIKBKB
Hydrochloric Acid SCHEMBL7452746 0.80 IKBKB (0.66) IKBKBDDB1CRBNROCK1SLC6A2
SCHEMBL11663045 0.79 SLC6A4 (0.47) PDK2MTNR1AMAOBMCHR1SLC6A2
SCHEMBL20325528 0.79 MAOB (0.53) ABL1MTNR1AMAOBIKBKBCYP1A2
SCHEMBL2242868 0.79 PARP10 (0.55) PDK2
SCHEMBL15565641 0.78 IKBKB (0.41) FAAHEPHX1PDK2L3MBTL1IKBKB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7235343-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-06-26 US disclosed
US-20040229162-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-11-18 US disclosed
EP-0459495-B1 Process for the acylation of naphthylethers with the aid of zeolite-catalysts HOECHST AG (DE) 1995-01-25 EP disclosed
US-5227529-A Low temperature, catalyst selectivity HOECHST AKTIENGESELLSCHAFT (DE) 1993-07-13 US disclosed
EP-0459495-A2 Process for the acylation of naphthylethers with the aid of zeolite-catalysts HOECHST AKTIENGESELLSCHAFT (DE) 1991-12-04 EP disclosed