SCHEMBL5369950

SCHEMBL5369950

C=CC(=O)OC(O)(CC)OCCCC

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.53
HPGD P15428 1/20 0.53
ATM Q13315 1/20 0.39
THRB P10828 4/20 0.39
ALDH1A1 P00352 5/20 0.36
CYP3A4 P08684 2/20 0.36
HCAR2 Q8TDS4 3/20 0.35
THRA P10827 1/20 0.33
TP53 P04637 3/20 0.32
HIF1A Q16665 3/20 0.32
HSD17B10 Q99714 1/20 0.32
ZDHHC20 Q5W0Z9 1/20 0.32
ZDHHC2 Q9UIJ5 1/20 0.32
MAPT P10636 1/20 0.31
RAB9A P51151 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
MAPK1 P28482 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4134508 0.94 TSHR (0.46) TSHRHPGDTHRBALDH1A1CYP3A4
SCHEMBL31390458 0.82 THRB (0.43) TSHRHPGDTHRBALDH1A1CYP3A4
SCHEMBL3422881 0.79 TSHR (0.56) TSHRHPGDATMTHRBALDH1A1
SCHEMBL31345766 0.77 THRB (0.40) TSHRHPGDTHRBALDH1A1CYP3A4
SCHEMBL28125584 0.76 TSHR (0.45) TSHRHPGDATMTHRBALDH1A1
SCHEMBL20597461 0.75 TSHR (0.39) TSHRHPGDATMTHRBALDH1A1
SCHEMBL4236581 0.74 TSHR (0.50) TSHRHPGDATMTHRBALDH1A1
SCHEMBL29428358 0.73 TSHR (0.44) TSHRHPGDTHRBTHRAZDHHC20
SCHEMBL28195407 0.73 TSHR (0.73) TSHRHPGDATMTHRBALDH1A1
SCHEMBL2129126 0.72 TSHR (0.47) TSHRHPGDATMTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US claimed
US-7201978-B2 Magnetic recording medium TDK CORPORATION (JP) 2007-04-10 US disclosed
US-20060115687-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same and magnetic recording medium using the same TDK CORPORATION (JP) 2006-06-01 US disclosed
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US disclosed
US-7001955-B2 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2006-02-21 US disclosed
US-20050118459-A1 Magnetic recording medium TDK CORPORATION (JP) 2005-06-02 US disclosed
US-20040241453-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040241497-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040034165-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2004-02-19 US disclosed
US-6164785-A Antiglaring film DAI NIPPON PRINTING CO., LTD. (JP) 2000-12-26 US disclosed