SCHEMBL5374402

SCHEMBL5374402

COCCOCCn1cnc2ccccc21

nearest known ligand 0.85

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 9/20 0.85
LMNA P02545 6/20 0.85
TDP1 Q9NUW8 1/20 0.62
L3MBTL1 Q9Y468 1/20 0.61
ALOX15 P16050 1/20 0.58
TSHR P16473 1/20 0.58
HTT P42858 5/20 0.57
MAPT P10636 3/20 0.57
STAT3 P40763 1/20 0.57
RAB9A P51151 3/20 0.56
GAA P10253 1/20 0.56
MEN1 O00255 3/20 0.56
KMT2A Q03164 3/20 0.56
LTA4H P09960 1/20 0.53
NPC1 O15118 2/20 0.51
NFKB1 P19838 1/20 0.51
NFKB2 Q00653 1/20 0.51
RELA Q04206 1/20 0.51
PKM P14618 1/20 0.51
EGLN3 Q9H6Z9 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL92599 1.00 SMN1; SMN2 (0.85) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL14423493 1.00 SMN1; SMN2 (0.85) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL501944 1.00 SMN1; SMN2 (0.85) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL502183 0.94 SMN1; SMN2 (0.75) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL352367 0.92 SMN1; SMN2 (1.00) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL29924240 0.92 SMN1; SMN2 (1.00) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL351186 0.92 SMN1; SMN2 (1.00) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL1024585 0.91 SMN1; SMN2 (0.73) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL352045 0.91 SMN1; SMN2 (0.96) SMN1; SMN2LMNATDP1L3MBTL1ALOX15
SCHEMBL22307532 0.90 SMN1; SMN2 (0.68) SMN1; SMN2LMNATDP1L3MBTL1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed