SCHEMBL5374411

SCHEMBL5374411

COCCn1c(-c2ccccc2)nc2ccccc21

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 1.00
KDM4E B2RXH2 9/20 0.80
ALDH1A1 P00352 6/20 0.80
SMN1; SMN2 Q16637 4/20 0.80
CASR P41180 1/20 0.76
HSD17B10 Q99714 5/20 0.73
RECQL P46063 1/20 0.70
TSHR P16473 3/20 0.60
GAA P10253 2/20 0.60
LMNA P02545 2/20 0.60
NPSR1 Q6W5P4 2/20 0.60
NPC1 O15118 3/20 0.59
RAB9A P51151 3/20 0.59
GLA P06280 1/20 0.59
PDE6D O43924 1/20 0.59
ALDH2 P05091 1/20 0.59
ALDH3A1 P30838 1/20 0.59
TP53 P04637 4/20 0.58
MAPT P10636 2/20 0.58
NSD2 O96028 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL501617 0.92 HPGD (0.84) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL5377582 0.92 HPGD (0.84) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL501667 0.92 HPGD (0.84) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL501872 0.89 HPGD (0.80) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL501937 0.89 HPGD (0.80) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL5375501 0.85 KDM4E (1.00) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL501712 0.83 HPGD (0.70) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL5009001 0.83 HPGD (0.70) HPGDKDM4EALDH1A1SMN1; SMN2CASR
SCHEMBL227741 0.83 KDM4E (0.74) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL29056711 0.82 HPGD (0.69) HPGDKDM4EALDH1A1SMN1; SMN2CASR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed