SCHEMBL5375501

SCHEMBL5375501

CCOCCn1c(-c2ccccc2)nc2ccccc21

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 1.00
HSD17B10 Q99714 3/20 0.79
HPGD P15428 1/20 0.74
MYC P01106 1/20 0.65
TSHR P16473 3/20 0.61
MEN1 O00255 1/20 0.61
KMT2A Q03164 1/20 0.61
ALDH1A1 P00352 4/20 0.60
SMN1; SMN2 Q16637 2/20 0.60
LMNA P02545 3/20 0.58
GAA P10253 1/20 0.58
NPSR1 Q6W5P4 1/20 0.58
CASR P41180 1/20 0.57
RAB9A P51151 1/20 0.57
PDE6D O43924 1/20 0.56
ALDH2 P05091 1/20 0.56
ALDH3A1 P30838 1/20 0.56
TP53 P04637 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL501777 0.87 KDM4E (0.76) KDM4EHSD17B10HPGDMYCTSHR
SCHEMBL501667 0.86 HPGD (0.84) KDM4EHSD17B10HPGDTSHRALDH1A1
SCHEMBL5377582 0.86 HPGD (0.84) KDM4EHSD17B10HPGDTSHRALDH1A1
SCHEMBL501937 0.86 HPGD (0.80) KDM4EHSD17B10HPGDMYCTSHR
SCHEMBL501617 0.86 HPGD (0.84) KDM4EHSD17B10HPGDTSHRALDH1A1
SCHEMBL5374411 0.85 HPGD (1.00) KDM4EHSD17B10HPGDTSHRKMT2A
SCHEMBL501872 0.84 HPGD (0.80) KDM4EHSD17B10HPGDMYCTSHR
SCHEMBL5373120 0.84 KDM4E (0.72) KDM4EHSD17B10TSHRMEN1KMT2A
SCHEMBL227741 0.83 KDM4E (0.74) KDM4EHSD17B10HPGDTSHRALDH1A1
Hydrochloric Acid SCHEMBL7173170 0.82 KDM4E (0.70) KDM4EHSD17B10HPGDMYCTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7629108-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-08 US disclosed
US-20080102405-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-05-01 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080102405-A1 Nitrogen-containing organic compound, resist composition and patterning process MDM4, MUS81, NOP2 KDM4E 1401/4885HSD17B10 4077/4885HPGD 2728/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.