SCHEMBL5377582

SCHEMBL5377582

COCCOCCn1c(-c2ccccc2)nc2ccccc21

nearest known ligand 0.84

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HPGD P15428 2/20 0.84
▸ KDM4E B2RXH2 10/20 0.76
▸ ALDH1A1 P00352 7/20 0.68
▸ SMN1; SMN2 Q16637 6/20 0.68
▸ HSD17B10 Q99714 5/20 0.66
▸ CASR P41180 1/20 0.65
▸ NPC1 O15118 3/20 0.62
▸ RAB9A P51151 3/20 0.62
▸ PKM P14618 1/20 0.62
▸ NFKB1 P19838 1/20 0.62
▸ NFKB2 Q00653 1/20 0.62
▸ RELA Q04206 1/20 0.62
▸ RECQL P46063 1/20 0.60
▸ LMNA P02545 2/20 0.55
▸ TSHR P16473 2/20 0.55
▸ GAA P10253 2/20 0.55
▸ NPSR1 Q6W5P4 2/20 0.55
▸ PDE6D O43924 1/20 0.54
▸ ALDH2 P05091 1/20 0.54
▸ ALDH3A1 P30838 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL501617 1.00 HPGD (0.84) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL501667 1.00 HPGD (0.84) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL501872 0.95 HPGD (0.80) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL5374411 0.92 HPGD (1.00) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL501937 0.89 HPGD (0.80) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL501777 0.87 KDM4E (0.76) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL501919 0.86 HPGD (0.67) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL5375501 0.86 KDM4E (1.00) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL501902 0.85 HPGD (0.68) HPGDKDM4EALDH1A1SMN1; SMN2HSD17B10
SCHEMBL5371056 0.85 SMN1; SMN2 (0.63) HPGDKDM4EALDH1A1SMN1; SMN2CASR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 — — US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 — — US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 — — US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 — — US disclosed
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