SCHEMBL5377374

SCHEMBL5377374

COCCOCCOCCOCCOCCOCCn1c(C)nc2ccccc21

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.63
KDM4E B2RXH2 4/20 0.63
ALDH1A1 P00352 3/20 0.63
PKM P14618 2/20 0.63
NPC1 O15118 2/20 0.63
RAB9A P51151 2/20 0.63
NFKB1 P19838 1/20 0.63
NFKB2 Q00653 1/20 0.63
RELA Q04206 1/20 0.63
HPGD P15428 1/20 0.59
LMNA P02545 1/20 0.58
TP53 P04637 1/20 0.58
HTT P42858 1/20 0.58
POLB P06746 1/20 0.56
MAPK1 P28482 1/20 0.56
ATM Q13315 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
CASR P41180 1/20 0.52
TNF P01375 1/20 0.51
GLA P06280 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5371056 1.00 SMN1; SMN2 (0.63) SMN1; SMN2KDM4EALDH1A1PKMNPC1
SCHEMBL5374092 1.00 SMN1; SMN2 (0.63) SMN1; SMN2KDM4EALDH1A1PKMNPC1
SCHEMBL5381431 1.00 SMN1; SMN2 (0.63) SMN1; SMN2KDM4EALDH1A1PKMNPC1
SCHEMBL5009001 0.91 HPGD (0.70) SMN1; SMN2KDM4EALDH1A1PKMNPC1
SCHEMBL5374437 0.88 KDM4E (0.68) SMN1; SMN2KDM4EALDH1A1PKMRAB9A
SCHEMBL9348025 0.85 LMNA (0.58) KDM4EPKMNPC1RAB9AHPGD
SCHEMBL5373120 0.85 KDM4E (0.72) SMN1; SMN2KDM4EALDH1A1PKMRAB9A
SCHEMBL501617 0.85 HPGD (0.84) SMN1; SMN2KDM4EALDH1A1PKMNPC1
SCHEMBL501667 0.85 HPGD (0.84) SMN1; SMN2KDM4EALDH1A1PKMNPC1
SCHEMBL5377582 0.85 HPGD (0.84) SMN1; SMN2KDM4EALDH1A1PKMNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed