SCHEMBL5377889

SCHEMBL5377889

CC(C)C(C)(C)OC(=O)C1CC2C=CC1C2

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.46
KDM4E B2RXH2 1/20 0.45
LMNA P02545 1/20 0.45
HPGD P15428 1/20 0.38
POLB P06746 3/20 0.38
KMT2A Q03164 2/20 0.38
RAB9A P51151 1/20 0.37
APEX1 P27695 1/20 0.36
RECQL P46063 1/20 0.36
BLM P54132 1/20 0.36
ESR2 Q92731 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
THRB P10828 1/20 0.34
MAPK1 P28482 1/20 0.33
CETP P11597 1/20 0.31
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30862606 0.85 KDM4E (0.49) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL14534917 0.85 KDM4E (0.49) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL525537 0.85 KDM4E (0.49) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL14628488 0.85 KDM4E (0.49) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL3881802 0.83 KDM4E (0.44) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL22263912 0.82 KDM4E (0.46) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL28630884 0.81 KDM4E (0.45) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL28634176 0.80 ALDH1A1 (0.41) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL1409796 0.79 KDM4E (0.44) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL5944193 0.79 KDM4E (0.44) ALDH1A1KDM4ELMNAHPGDPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-20200264511-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-08-20 US disclosed
EP-3693793-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT Mitsui Chemicals, Inc. (JP) 2020-08-12 EP disclosed
US-20200241419-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-07-30 US disclosed
US-7199074-B2 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2007-04-03 US disclosed
US-7172986-B2 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2007-02-06 US disclosed
US-7087687-B2 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2006-08-08 US disclosed
EP-1607414-A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2005-12-21 EP disclosed
EP-1607413-A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2005-12-21 EP disclosed
US-20050277569-A1 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY 2005-12-15 US disclosed
US-20050277749-A1 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY 2005-12-15 US disclosed
US-20050043494-A1 Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY 2005-02-24 US disclosed
EP-1508577-A1 A catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers ROHM AND HAAS COMPANY (US) 2005-02-23 EP disclosed