SCHEMBL5378153

SCHEMBL5378153

CC(=O)c1ccc2c3c(cccc13)C=C2

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.56
KDM4E B2RXH2 4/20 0.56
HPGD P15428 2/20 0.56
GAA P10253 4/20 0.54
TSHR P16473 1/20 0.54
MAPT P10636 4/20 0.42
POLB P06746 3/20 0.40
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
TAAR1 Q96RJ0 1/20 0.40
BRPF1 P55201 1/20 0.39
PBRM1 Q86U86 1/20 0.38
NSD2 O96028 1/20 0.38
MCL1 Q07820 1/20 0.38
AKR1C4 P17516 1/20 0.37
AKR1C3 P42330 1/20 0.37
AKR1C2 P52895 1/20 0.37
AKR1C1 Q04828 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5375991 0.82 TYMS (0.51) ALDH1A1KDM4EGAAMAPTPOLB
SCHEMBL16131281 0.81 ATM (0.47) ALDH1A1KDM4EHPGDGAATSHR
SCHEMBL8765365 0.80 KDM4E (0.45) ALDH1A1KDM4EHPGDTSHRPOLB
SCHEMBL8711710 0.76 MEN1 (0.55) ALDH1A1KDM4EHPGDPOLBMEN1
SCHEMBL38573232 0.74 KDM4E (0.55) ALDH1A1KDM4EHPGDGAATSHR
SCHEMBL38471077 0.74 KDM4E (0.55) ALDH1A1KDM4EHPGDGAATSHR
SCHEMBL7119411 0.74 KDM4E (0.55) ALDH1A1KDM4EHPGDGAATSHR
SCHEMBL10391045 0.74 KDM4E (0.55) ALDH1A1KDM4EHPGDGAATSHR
SCHEMBL18084557 0.73 ALDH1A1 (0.56) ALDH1A1KDM4EHPGDGAATSHR
SCHEMBL5708408 0.73 ALDH1A1 (0.56) ALDH1A1KDM4EHPGDGAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed