SCHEMBL8765365

SCHEMBL8765365

COC(=O)c1ccc2c3c(cccc13)C=C2

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.45
PSMD14 O00487 1/20 0.43
NR4A2 P43354 6/20 0.43
CREBBP Q92793 1/20 0.42
LMNA P02545 1/20 0.42
TSHR P16473 1/20 0.42
ALDH1A1 P00352 2/20 0.41
CFTR P13569 1/20 0.41
HSD17B10 Q99714 1/20 0.41
BRD4 O60885 1/20 0.41
CA12 O43570 2/20 0.40
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
CA7 P43166 2/20 0.40
CA9 Q16790 2/20 0.40
CA14 Q9ULX7 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
MAP2K1 Q02750 1/20 0.40
PTPRC P08575 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19082607 0.82 KDM4E (0.50) KDM4EPSMD14NR4A2CREBBPLMNA
SCHEMBL19082604 0.82 KDM4E (0.50) KDM4EPSMD14NR4A2CREBBPLMNA
SCHEMBL30151495 0.82 TSHR (0.52) KDM4EPSMD14NR4A2CREBBPLMNA
SCHEMBL5378153 0.80 ALDH1A1 (0.56) KDM4ETSHRALDH1A1BRD4MEN1
SCHEMBL5375991 0.78 TYMS (0.51) KDM4EPSMD14NR4A2ALDH1A1HSD17B10
SCHEMBL19258188 0.77 NR4A2 (0.55) KDM4EPSMD14NR4A2CREBBPLMNA
SCHEMBL19082608 0.77 KDM4E (0.46) KDM4EPSMD14NR4A2CREBBPLMNA
SCHEMBL70381 0.77 BRD4 (0.59) KDM4ENR4A2CREBBPLMNATSHR
SCHEMBL29434198 0.77 BRD4 (0.59) KDM4ENR4A2CREBBPLMNATSHR
SCHEMBL70429 0.77 LMNA (0.59) KDM4EPSMD14NR4A2CREBBPLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-06 US disclosed
US-10023752-B2 Conductive material and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-17 US disclosed
US-10020089-B2 Conductive polymer composite and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-10 US disclosed
US-9991019-B2 Conductive polymer composite and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 US disclosed
US-20180134860-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-17 US disclosed
US-9922747-B2 Conductive material and substrate SHIN-ETSU HANDOTAI CO., LTD. (JP) 2018-03-20 US disclosed
US-9916916-B2 Conductive material and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-13 US disclosed
US-9897917-B2 Conductive polymer composition, coated article, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-20 US disclosed
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-20150030983-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-01-29 US disclosed
US-20150030983-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-01-29 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-20140178820-A1 RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-20140178820-A1 RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed
US-20140065544-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed
US-20140065544-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed
EP-0505972-B1 Process for producing styrenic copolymer IDEMITSU KOSAN CO (JP) 1997-06-11 EP disclosed
EP-0505972-A2 Process for producing styrenic copolymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-09-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND HCN4, HCN2, HCN3 KDM4E 1649/4885PSMD14 4560/4885NR4A2 3867/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.