⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8800224 | 1.00 | — | — | |
| SCHEMBL5500748 | 0.85 | CPB2 (0.48) | — | |
| SCHEMBL3893901 | 0.83 | CHRM1 (0.55) | — | |
| SCHEMBL29100382 | 0.82 | GABRR1 (0.46) | — | |
| SCHEMBL21315600 | 0.81 | — | — | |
| SCHEMBL3784895 | 0.81 | — | — | |
| Ammonia Solution, Strong SCHEMBL8998230 | 0.80 | TDP1 (0.52) | — | |
| SCHEMBL902752 | 0.80 | — | — | |
| SCHEMBL4892262 | 0.79 | GABRR1 (0.48) | — | |
| SCHEMBL5698827 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116813381-A | Biological ceramic surface bioactive coating and preparation method thereof | 化学与精细化工广东省实验室潮州分中心 | 2023-09-29 | — | — | CN | claimed |
| CN-116813381-A | Biological ceramic surface bioactive coating and preparation method thereof | 化学与精细化工广东省实验室潮州分中心 | 2023-09-29 | — | — | CN | disclosed |
| CN-101625524-B | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO JP | 2012-11-28 | — | — | CN | disclosed |
| CN-102591152-A | Resist composition and patterning process | SHIN ETSU EHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102520581-A | Method for forming photoresist pattern | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| US-7303852-B2 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20030235779-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030036603-A1 | Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-02-20 | — | — | US | disclosed |
| EP-0051234-B1 | A PROCESS FOR THE PRODUCTION OF A 2-AZETIDINONE DERIVATIVE | ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) | 1985-03-13 | — | — | EP | disclosed |
| EP-0051234-A1 | A process for the production of a 2-azetidinone derivative | ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) | 1982-05-12 | — | — | EP | disclosed |