⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27956490 | 0.98 | CYP1A2 (0.40) | — | |
| SCHEMBL7594598 | 0.87 | TDP1 (0.48) | — | |
| SCHEMBL29286860 | 0.87 | MEN1 (0.46) | — | |
| SCHEMBL28526239 | 0.87 | MEN1 (0.46) | — | |
| SCHEMBL22360077 | 0.86 | CYP1A2 (0.43) | — | |
| SCHEMBL28577945 | 0.86 | CYP1A2 (0.59) | — | |
| SCHEMBL7600473 | 0.84 | — | — | |
| SCHEMBL4188661 | 0.84 | HTR2C (0.46) | — | |
| Hydrochloric Acid SCHEMBL27956469 | 0.84 | CYP1A2 (0.57) | — | |
| SCHEMBL475320 | 0.84 | ADRA2A (0.52) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013033046-A2 | FLUORESCENT PL MARKERS FOR ISOELECTRIC FOCUSING SEPARATIONS AND FLUORESCENT LABELING | VIGH GYULA (US) | 2013-03-07 | — | — | WO | disclosed |
| US-7303852-B2 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20050079446-A1 | Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20030235779-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030036603-A1 | Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-02-20 | — | — | US | disclosed |
| EP-0736118-B1 | COATED POLYMERIC FABRIC HAVING DURABLE WETTABILITY AND REDUCED ADSORPTION OF PROTEIN | KIMBERLY CLARK CO (US) | 2001-11-14 | — | — | EP | disclosed |
| EP-0736118-A1 | COATED POLYMERIC FABRIC HAVING DURABLE WETTABILITY AND REDUCED ADSORPTION OF PROTEIN | KIMBERLY-CLARK CORPORATION (US) | 1996-10-09 | — | — | EP | disclosed |
| US-5540984-A | POLYETHERSILOXANE SURFACTANT; DISPOSABLE PRODUCTS | KIMBERLY-CLARK CORPORATION (US) | 1996-07-30 | — | — | US | disclosed |
| US-5525415-A | USED AS DIAPERS, FEMININE CARE PRODUCTS, INCONTINENT CARE PRODUCTS, TRAINING PANTS AND WIPES | KIMBERLY CLARK CORPORATION (US) | 1996-06-11 | — | — | US | disclosed |
| US-5500254-A | APPLYING POLYETHERSILOXANE COPOLYMER SURFACTANT | KIMBERLY-CLARK CORPORATION (US) | 1996-03-19 | — | — | US | disclosed |
| US-5455108-A | Polyethersiloxane surfactant coating on polyolefin fabric; treatment with air corona discharge; disposable products | KIMBERLY-CLARK CORPORATION (US) | 1995-10-03 | — | — | US | disclosed |
| WO-1995017545-A2 | COATED POLYMERIC FABRIC HAVING DURABLE WETTABILITY AND REDUCED ADSORPTION OF PROTEIN | KIMBERLY-CLARK CORPORATION (US) | 1995-06-29 | — | — | WO | disclosed |