SCHEMBL5384353

SCHEMBL5384353

[CH2]COC(=O)C1CCCO1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.42
KDM4E B2RXH2 4/20 0.41
HSD17B10 Q99714 2/20 0.41
HPGD P15428 7/20 0.40
NPSR1 Q6W5P4 2/20 0.40
TSHR P16473 1/20 0.40
LMNA P02545 2/20 0.40
NOS2 P35228 1/20 0.39
POLB P06746 3/20 0.39
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
TP53 P04637 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
MAPT P10636 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20599622 0.82 ALDH1A1 (0.43) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL22356176 0.81 NOS2 (0.44) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL1813924 0.81 HPGD (0.50) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL22356162 0.81 NOS2 (0.44) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL8626242 0.81 HPGD (0.50) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL8627456 0.81 HPGD (0.50) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL7162585 0.80 ALDH1A1 (0.40) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL17361198 0.80 ALDH1A1 (0.40) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL17361179 0.80 ALDH1A1 (0.40) ALDH1A1KDM4EHSD17B10HPGDNPSR1
SCHEMBL22480301 0.79 ALDH1A1 (0.41) ALDH1A1KDM4EHSD17B10HPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7179581-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-20 US disclosed
US-20040234885-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-11-25 US disclosed