SCHEMBL5385167

SCHEMBL5385167

C=C(C(=O)OC)C1CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6135392 0.91 ALDH1A1 (0.42)
SCHEMBL613516 0.91 ALDH1A1 (0.42)
SCHEMBL2231567 0.89 CES2 (0.42)
SCHEMBL93544 0.86 ALDH1A1 (0.35)
SCHEMBL11575681 0.81 HPGD (0.33)
SCHEMBL11984196 0.79 ALDH1A1 (0.41)
SCHEMBL48775 0.79 ALDH1A1 (0.58)
SCHEMBL25292397 0.79 ALDH1A1 (0.33)
SCHEMBL352711 0.79 PPM1B (0.39)
SCHEMBL21643767 0.78 HSD17B10 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7294663-B2 Compatibility improvement in aromatic polyesters with mineral fillers E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-11-13 US claimed
US-5089353-A Heat resistant, nondeforming food containers; long shelf life; saponified ethylene-vinyl acetate copolymer and styrene-based polymer with syndiotactic configuration KURARAY CO., LTD. (JP) 1992-02-18 US claimed
EP-0106982-A2 Elastomeric sol/gel blends E.I. DU PONT DE NEMOURS AND COMPANY (US) 1984-05-02 EP claimed
CN-113292594-B Long wave absorption photoinitiator 义获嘉伟瓦登特公司 2023-09-05 CN disclosed
CN-104914670-B White photosensitive polymer combination, using its hardening thing and containing the hardening thing be constituent touch panel Nitto Chemical Material Co., Ltd. (JP) 2019-11-01 CN disclosed
CN-106279045-B Cyclopropane derivative and preparation method thereof and application in medicine 四川海思科制药有限公司 2019-08-16 CN disclosed
CN-106279045-A Cyclopropane derivative and preparation method thereof and in application pharmaceutically 四川海思科制药有限公司 2017-01-04 CN disclosed
CN-104271345-B Substrate and the contact panel parts using it TORAY INDUSTRIES, INC. (JP) 2016-03-23 CN disclosed
US-9290672-B2 Ink composition and ink jet recording method SEIKO EPSON CORPORATION (JP) 2016-03-22 US disclosed
CN-104914670-A White photosensitive resin composition, cured product using the same, and touch panel including such cured product as a component NIPPON STEEL & SUMIKIN CHEM CO 2015-09-16 CN disclosed
CN-104271345-A Substrate and touch panel member using same TORAY INDUSTRIES 2015-01-07 CN disclosed
EP-1194279-A1 PROFILE OR MOLDING HAVING A FRINGED SURFACE STRUCTURE Advanced Design Concepts GmbH (DE) 2002-04-10 EP disclosed
CN-1070833-C Process for preparing cyclopropyl acetylene derivatives KURARAY CO (JP) 2001-09-12 CN disclosed
WO-2001005572-A9 PROFILE OR MOLDING HAVING A FRINGED SURFACE STRUCTURE DOW EUROP SA (CH) 2001-03-01 WO disclosed
CN-1281840-A Process for preparation of cyclopropyl acethlene derivative KURARAY CO (JP) 2001-01-31 CN disclosed
CN-1281846-A Method for preparation of cyclopropyl acrylic derivative KURARAY CO (JP) 2001-01-31 CN disclosed
WO-2001005572-A1 PROFILE OR MOLDING HAVING A FRINGED SURFACE STRUCTURE ADVANCED DESIGN CONCEPT GMBH (DE) 2001-01-25 WO disclosed
US-5955627-A Process for the preparation of cyclopropylacetylene derivatives KURARAY CO., LTD. (JP) 1999-09-21 US disclosed
CN-1191856-A Process for preparing cyclopropyl acetylene derivatives KURARAY CO (JP) 1998-09-02 CN disclosed
EP-0847974-A1 Process for the preparation of cyclopropylacetylene and its derivatives KURARAY CO., LTD. (JP) 1998-06-17 EP disclosed