SCHEMBL538990

SCHEMBL538990

O=P(O)(O)OC(Cl)C(Cl)(Cl)OP(=O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28529710 0.78 CYP2C19 (0.34)
SCHEMBL16110632 0.76 SMPD1 (0.31)
SCHEMBL2569940 0.75 FDPS (0.33)
SCHEMBL28599727 0.74 CYP2C19 (0.32)
SCHEMBL990591 0.71 SMPD1 (0.33)
SCHEMBL11449225 0.70 SRC (0.44)
SCHEMBL4612999 0.66
SCHEMBL7461477 0.66 FDPS (0.39)
SCHEMBL8336437 0.66 FDPS (0.39)
SCHEMBL3148932 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118182960-A Filling equipment and filling method for non-expansion steel structure fireproof paint 江苏欣安新材料技术有限公司 2024-06-14 CN disclosed
US-8173343-B2 Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge RICOH COMPANY, LTD. (JP) 2012-05-08 US disclosed
EP-2146251-B1 Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge RICOH CO LTD (JP) 2012-02-08 EP disclosed
US-20100015538-A1 ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING APPARATUS USING THE SAME, AND PROCESS CARTRIDGE RICOH COMPANY, LTD. (JP) 2010-01-21 US disclosed
EP-2146251-A1 Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge Ricoh Company, Ltd. (JP) 2010-01-20 EP disclosed
US-5173560-A Using a 2,2,6,6-dimethylpiperidine compound to block the diisocyanate/polyether(-ester) copolymer to control the reaction speed; coatings; seals; encapsulation; light and weather resistance HUELS AKTIENGESELLSCHAFT (DE) 1992-12-22 US disclosed