SCHEMBL5394207

SCHEMBL5394207

C=C(C)C(=O)OCC[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.50

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 3/20 0.48
ALDH1A1 P00352 2/20 0.43
POLB P06746 1/20 0.37
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1772849 0.89 TSHR (0.55) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL5391675 0.88 THRB (0.41) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL3887236 0.83 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL145422 0.83 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL25329219 0.82 THRB (0.52) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL6512429 0.80 THRB (0.50) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL12660503 0.80 THRB (0.50) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL65596 0.80 THRB (0.50) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL6510428 0.80 THRB (0.50) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL5395018 0.79 THRB (0.31) THRBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 US disclosed
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 US disclosed
US-11801333-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-31 US disclosed
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-11783958-B2 Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-11643492-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20180223133-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-09 US disclosed
US-20180197653-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND, BIOLOGICAL ELECTRODE COMPOSITION, BIOLOGICAL ELECTRODE, AND METHOD FOR PRODUCING BIOLOGICAL ELECTRODE SHIH-ETSU CHEMICAL CO., LTD. (JP) 2018-07-12 US disclosed
US-20180193632-A1 BIOMEDICAL ELECTRODE COMPOSITION, BIOMEDICAL ELECTRODE AND METHOD FOR MANUFACTURING THE BIOMEDICAL ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-12 US disclosed
US-20180168470-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-21 US disclosed
US-20030224291-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-04 US disclosed
US-20030224560-A1 Method for manufacturing an electronic device HITACHI, LTD. 2003-12-04 US disclosed
US-RE38282-E1 Process for using bilayer photoresist INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-10-21 US disclosed
US-6492089-B2 POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-10 US disclosed
US-6291696-B2 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-18 US disclosed
JP-2001253885-A METHOD FOR PRODUCING TRIS(TRIMETHYLSILYL)SILYLETHYL ESTER SHIN ETSU CHEM CO LTD 2001-09-18 JP disclosed
US-20010007909-A1 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-07-12 US disclosed
US-20010003772-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICDL CO., LTD. OF (JP) 2001-06-14 US disclosed
US-6210856-B1 Resist composition and process of forming a patterned resist layer on a substrate INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-04-03 US disclosed
US-5985524-A Process for using bilayer photoresist INTERNATIONAL BUSINESS MACHINES INCORPORATED (US) 1999-11-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180193632-A1 BIOMEDICAL ELECTRODE COMPOSITION, BIOMEDICAL ELECTRODE AND METHOD FOR MANUFACTURING THE BIOMEDICAL ELECTRODE KCNN2, KCNN1, HCN4 THRB 1813/4885TSHR 2614/4885ALDH1A1 1177/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.