SCHEMBL5400007

SCHEMBL5400007

[CH2]c1cccc2cc3cc4ccccc4cc3cc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.44
KDM4E B2RXH2 3/20 0.44
GAA P10253 2/20 0.44
HSD17B10 Q99714 6/20 0.42
HIF1A Q16665 4/20 0.42
CYP1B1 Q16678 1/20 0.42
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
MAPT P10636 3/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CASP1 P29466 3/20 0.39
CASP7 P55210 2/20 0.39
CYP3A4 P08684 2/20 0.39
ALOX15 P16050 1/20 0.39
HBB P68871 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CYP1A2 P05177 4/20 0.39
ACHE P22303 2/20 0.39
ERBB2 P04626 1/20 0.39
FYN P06241 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL130782 0.98 ALDH1A1 (0.45) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL6521617 0.80 CYP1A2 (0.48) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL3976464 0.80 ALDH1A1 (0.40) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL31127473 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL25966 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL15063036 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL29975167 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL4850502 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL190685 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A
SCHEMBL30087026 0.76 ALDH1A1 (0.68) ALDH1A1KDM4EGAAHSD17B10HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7261995-B2 Nitrogen-containing organic compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-28 US disclosed
US-20050238993-A1 Nitrogen-containing organic compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-10-27 US disclosed