Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8483280 | 1.00 | PTPN1 (0.33) | PTPN1ACHEMEN1ALDH1A1LMNA | |
| Acrylic Acid SCHEMBL8027301 | 0.87 | LMNA (0.30) | LMNA | |
| Methacrylic Acid SCHEMBL8017418 | 0.87 | — | — | |
| SCHEMBL8027296 | 0.64 | — | — | |
| SCHEMBL30690115 | 0.61 | CHRNB2 (0.33) | ALDH1A1LMNA | |
| SCHEMBL30690113 | 0.61 | CHRNB2 (0.33) | ALDH1A1LMNA | |
| SCHEMBL5478238 | 0.61 | CHRNB2 (0.33) | ALDH1A1LMNA | |
| SCHEMBL2386035 | 0.60 | CYP19A1 (0.37) | MEN1ALDH1A1LMNAMAPTKMT2A | |
| SCHEMBL30396070 | 0.60 | LMNA (0.32) | ALDH1A1LMNA | |
| SCHEMBL7752606 | 0.60 | CRBN (0.35) | MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2003093287-A1 | NOVEL METHOD FOR PREPARING ALPHA-GLYCOSYLCERAMIDES, NOVEL ALPHA-GLYCOSYLCERAMIDE DERIVATIVES AND THEIR USES | INSTITUT PASTEUR (FR) | 2003-11-13 | — | — | WO | claimed |
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7119156-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-10-10 | — | — | US | disclosed |
| US-7070905-B2 | Pattern forming process | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-07-04 | — | — | US | disclosed |
| US-7063932-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-06-20 | — | — | US | disclosed |
| US-7029823-B2 | Resist composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-04-18 | — | — | US | disclosed |
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20050048400-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-03-03 | — | — | US | disclosed |
| US-20050037283-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20050037284-A1 | Polymer; radiation transparent pattern against short wavelengths and etching resistance; semiconductors | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-6660450-B2 | Acrylic ester polymer having pendant adamantane rings with oxygenated substitution; ultraviolet light transparency; dry etching resistance | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-09 | — | — | US | disclosed |
| WO-2003093287-A1 | NOVEL METHOD FOR PREPARING ALPHA-GLYCOSYLCERAMIDES, NOVEL ALPHA-GLYCOSYLCERAMIDE DERIVATIVES AND THEIR USES | INSTITUT PASTEUR (FR) | 2003-11-13 | — | — | WO | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6077644-A | Positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-5929271-A | Compounds for use in a positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5856497-A | Asymmetric synthesis of α-cycloalkylalkyl substituted methanamines | BOEHRINGER INGELHEIM PHARMACEUTICALS, INC. (US) | 1999-01-05 | — | — | US | disclosed |
| EP-0781750-A2 | Asymmetric synthesis of alpha-cycloalkylalkyl substituted methanamines | BOEHRINGER INGELHEIM PHARMACEUTICALS INC. (US) | 1997-07-02 | — | — | EP | disclosed |