Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 9/20 | 0.35 |
| ▸ | CA2 | P00918 | 9/20 | 0.35 |
| ▸ | MMP1 | P03956 | 4/20 | 0.32 |
| ▸ | MMP2 | P08253 | 4/20 | 0.32 |
| ▸ | MMP9 | P14780 | 4/20 | 0.32 |
| ▸ | MMP8 | P22894 | 4/20 | 0.32 |
| ▸ | MMP13 | P45452 | 4/20 | 0.32 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5422209 | 0.99 | CA2 (0.36) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL2895496 | 0.84 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1805141 | 0.84 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL2897585 | 0.82 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1804477 | 0.82 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1801411 | 0.82 | CA2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL114860 | 0.81 | CA1 (0.36) | CA1CA2 | |
| SCHEMBL3284975 | 0.81 | CA2 (0.40) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL548592 | 0.81 | CA1 (0.38) | CA1CA2 | |
| SCHEMBL51423 | 0.80 | CA2 (0.39) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |