Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 19/20 | 0.39 |
| ▸ | CA1 | P00915 | 18/20 | 0.39 |
| ▸ | MMP1 | P03956 | 5/20 | 0.35 |
| ▸ | MMP2 | P08253 | 5/20 | 0.35 |
| ▸ | MMP9 | P14780 | 5/20 | 0.35 |
| ▸ | MMP8 | P22894 | 5/20 | 0.35 |
| ▸ | MMP13 | P45452 | 5/20 | 0.35 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.33 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.33 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL59304 | 0.98 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL444424 | 0.98 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1805423 | 0.93 | CA1 (0.35) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3284035 | 0.91 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1804139 | 0.89 | GAA (0.35) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1800748 | 0.88 | CA1 (0.34) | CA2CA1PIK3CDPIK3CAPIK3CB | |
| SCHEMBL3982973 | 0.87 | CA2 (0.32) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3980025 | 0.85 | CA1 (0.33) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL1801411 | 0.85 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2895496 | 0.84 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2002 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-120005123-A | Acrylic ester block copolymer resin, photoresist, and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-113296359-B | Bottom layer composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119463075-A | Poly (4-hydroxystyrene) -based block copolymer and preparation and application thereof | 微芯新材料(湖州)有限公司 | 2025-02-18 | — | — | CN | claimed |
| US-20250021002-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-16 | — | — | US | claimed |
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| WO-2023082371-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | 上海新阳半导体材料股份有限公司 | 2023-05-19 | — | — | WO | claimed |
| US-20230119934-A1 | NETWORK POLYMERS AND METHODS OF MAKING AND USING SAME | UNIV COLORADO REGENTS (US) | 2023-04-20 | — | — | US | claimed |
| WO-2006091523-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | claimed |
| US-7033728-B2 | Photoresist composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-04-25 | — | — | US | claimed |
| EP-1612603-A2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2006-01-04 | — | — | EP | claimed |
| US-20050277055-A1 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2005-12-15 | — | — | US | claimed |
| WO-2005066714-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-07-21 | — | — | WO | claimed |
| US-20050147915-A1 | Photoresist composition | MERCK PATENT GMBH (DE) | 2005-07-07 | — | — | US | claimed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | claimed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | claimed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | claimed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | claimed |