SCHEMBL5404231

SCHEMBL5404231

C1=CC(c2cccc3ccccc23)CCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM1A O60341 1/20 0.43
SLC6A4 P31645 7/20 0.39
SLC6A2 P23975 3/20 0.39
SLC6A3 Q01959 3/20 0.39
DRD2 P14416 1/20 0.38
MTNR1A P48039 2/20 0.37
IDO1 P14902 1/20 0.37
MTNR1B P49286 1/20 0.35
PLA2G6 O60733 3/20 0.35
MAPK1 P28482 2/20 0.35
MAPT P10636 2/20 0.35
CYP3A4 P08684 2/20 0.35
FAAH O00519 1/20 0.35
NPC1 O15118 1/20 0.35
GMNN O75496 1/20 0.35
ALDH1A1 P00352 1/20 0.35
LMNA P02545 1/20 0.35
HPGD P15428 1/20 0.35
MTOR P42345 1/20 0.35
RAB9A P51151 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16398218 0.95 KDM1A (0.42) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL16398217 0.95 KDM1A (0.42) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL17747355 0.93 KDM1A (0.41) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL17747353 0.93 KDM1A (0.41) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL17747357 0.93 KDM1A (0.41) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL16398286 0.89 KDM1A (0.46) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL5408925 0.89 KDM1A (0.46) KDM1ASLC6A4SLC6A2SLC6A3DRD2
SCHEMBL9748792 0.84 MAPT (0.41) MAPTALDH1A1NPSR1PKMHSD17B10
Hydrochloric Acid SCHEMBL6384484 0.83 KDM1A (0.35) KDM1ASLC6A4SLC6A2SLC6A3MAPT
SCHEMBL1008916 0.82 KDM1A (0.46) KDM1ASLC6A4SLC6A2SLC6A3DRD2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed