Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | BPTF | Q12830 | 1/20 | 0.41 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.41 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.41 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.41 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.41 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.41 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.41 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8779341 | 0.86 | ALDH1A1 (0.46) | ALDH1A1BPTFLMNAP2RX7SMN1; SMN2 | |
| SCHEMBL5491237 | 0.78 | KDM4E (0.31) | — | |
| SCHEMBL5665931 | 0.78 | GRIN2D (0.45) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL6374520 | 0.76 | ALDH1A1 (0.47) | ALDH1A1BPTFGRIN2DGRIN3BGRIN1 | |
| SCHEMBL3021927 | 0.73 | ALDH1A1 (0.59) | ALDH1A1BPTFGRIN2DGRIN3BGRIN1 | |
| SCHEMBL19895701 | 0.73 | ALDH1A1 (0.53) | ALDH1A1BPTFCA12CA1CA2 | |
| SCHEMBL1073599 | 0.71 | ALDH1A1 (0.57) | ALDH1A1BPTFP2RX7SMN1; SMN2TSHR | |
| SCHEMBL13079619 | 0.70 | ALDH1A1 (0.46) | ALDH1A1BPTFP2RX7SMN1; SMN2TSHR | |
| SCHEMBL28056616 | 0.70 | ALDH1A1 (0.46) | ALDH1A1BPTFLMNAP2RX7SMN1; SMN2 | |
| SCHEMBL3454290 | 0.70 | ALDH1A1 (0.46) | ALDH1A1BPTFGRIN2DGRIN3BGRIN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1131677-B1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2005-08-03 | — | — | EP | claimed |
| US-20040023152-A1 | Photoresists, polymers and processes for microlithography | DUPONT ELECTRONICS, INC. | 2004-02-05 | — | — | US | claimed |
| US-6593058-B1 | Fluorine-containing copolymer contains sufficient functionality to render the photoresist developable so as to produce a relief image, following imagewise exposure to ultraviolet radiation | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-15 | — | — | US | claimed |
| EP-1131677-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2001-09-12 | — | — | EP | claimed |
| WO-2000017712-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-03-30 | — | — | WO | claimed |
| US-7276323-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-10-02 | — | — | US | disclosed |
| US-7166416-B2 | Protecting groups in polymers, photoresists and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-01-23 | — | — | US | disclosed |
| US-20050191579-A1 | Protecting groups in polymers, photoresists and processes for microlithography | FEIRING ANDREW E (US) | 2005-09-01 | — | — | US | disclosed |
| EP-1131677-B1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6899995-B2 | Protecting groups in polymers, photoresists and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-05-31 | — | — | US | disclosed |
| US-6849377-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-02-01 | — | — | US | disclosed |
| US-20040023150-A1 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-02-05 | — | — | US | disclosed |
| US-20040023152-A1 | Photoresists, polymers and processes for microlithography | DUPONT ELECTRONICS, INC. | 2004-02-05 | — | — | US | disclosed |
| US-20040023157-A1 | Protecting groups in polymers, photoresists and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY | 2004-02-05 | — | — | US | disclosed |
| EP-1340125-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-09-03 | — | — | EP | disclosed |
| US-6593058-B1 | Fluorine-containing copolymer contains sufficient functionality to render the photoresist developable so as to produce a relief image, following imagewise exposure to ultraviolet radiation | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-15 | — | — | US | disclosed |
| EP-1246013-A2 | Photoresists, polymers and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-10-02 | — | — | EP | disclosed |
| WO-2002044845-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |
| EP-1131677-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2001-09-12 | — | — | EP | disclosed |
| WO-2000017712-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-03-30 | — | — | WO | disclosed |