Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5405600 | 0.78 | ALDH1A1 (0.44) | — | |
| SCHEMBL418818 | 0.72 | KDM4E (0.35) | KDM4EHPGD | |
| SCHEMBL189533 | 0.70 | POLB (0.48) | KDM4EHPGD | |
| SCHEMBL7594583 | 0.69 | ALDH1A1 (0.37) | KDM4EHPGD | |
| SCHEMBL7082780 | 0.68 | ALDH1A1 (0.34) | KDM4EHPGD | |
| SCHEMBL7412340 | 0.68 | ALDH1A1 (0.39) | KDM4EHPGD | |
| SCHEMBL3716616 | 0.68 | ALDH1A1 (0.38) | KDM4EHPGD | |
| SCHEMBL246184 | 0.67 | — | — | |
| SCHEMBL226326 | 0.67 | — | — | |
| SCHEMBL4804370 | 0.67 | CYP1A2 (0.33) | KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7276323-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-10-02 | — | — | US | disclosed |
| US-6849377-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-02-01 | — | — | US | disclosed |
| US-6593058-B1 | Fluorine-containing copolymer contains sufficient functionality to render the photoresist developable so as to produce a relief image, following imagewise exposure to ultraviolet radiation | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-15 | — | — | US | disclosed |