⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3413463 | 0.84 | — | — | |
| SCHEMBL2727651 | 0.82 | SMN1; SMN2 (0.42) | — | |
| SCHEMBL1333841 | 0.76 | ALDH1A1 (0.46) | — | |
| SCHEMBL17730361 | 0.76 | — | — | |
| SCHEMBL72720 | 0.74 | LMNA (0.36) | — | |
| SCHEMBL11380791 | 0.74 | LMNA (0.36) | — | |
| SCHEMBL14417651 | 0.74 | SLC1A3 (0.32) | — | |
| SCHEMBL317946 | 0.71 | — | — | |
| SCHEMBL21802559 | 0.71 | — | — | |
| SCHEMBL1427169 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024204562-A1 | COMPOSITION FOR PROTECTIVE FILM FOR ELECTROCONDUCTIVE LAYER | 味の素株式会社 | 2024-10-03 | — | — | WO | disclosed |
| CN-107840808-B | Device for producing cyanoacetic acid ester and malonic acid ester by continuous reaction rectification and production process thereof | 烟台国邦化工机械科技有限公司 | 2024-06-14 | — | — | CN | disclosed |
| CN-107827779-B | Device for producing cyanoacetic acid ester and malonic acid ester by batch reaction rectification and production process thereof | 烟台国邦化工机械科技有限公司 | 2024-06-04 | — | — | CN | disclosed |
| CN-107827778-B | Device and process for refining cyanoacetic acid ester by continuous rectification | 烟台国邦化工机械科技有限公司 | 2024-01-12 | — | — | CN | disclosed |
| EP-4261241-A1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET | AJINOMOTO CO., INC. (JP) | 2023-10-18 | — | — | EP | disclosed |
| CN-116601202-A | Adhesive composition and adhesive sheet | 味之素株式会社 | 2023-08-15 | — | — | CN | disclosed |
| US-20230085579-A1 | PHOTOSENSITIVE COMPOSITION, CURED FILM, PHOTOSENSITIVE TRANSFER MATERIAL AND METHOD OF PRODUCING THE SAME, FILM, TOUCH PANEL, METHOD OF SUPPRESSING DETERIORATION, AND LAMINATE AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2023-03-16 | — | — | US | disclosed |
| CN-115477906-A | Adhesive composition, adhesive sheet, and electronic device | 味之素株式会社 | 2022-12-16 | — | — | CN | disclosed |
| WO-2022124357-A1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET | 味の素株式会社 | 2022-06-16 | — | — | WO | disclosed |
| CN-114502634-A | Sealing resin composition | 味之素株式会社 | 2022-05-13 | — | — | CN | disclosed |
| US-7238820-B2 | Fluorine-free metallic complexes for gas-phase chemical metal deposition | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2007-07-03 | — | — | US | disclosed |
| US-7238820-B2 | Fluorine-free metallic complexes for gas-phase chemical metal deposition | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2007-07-03 | — | — | US | disclosed |
| US-7238820-B2 | Fluorine-free metallic complexes for gas-phase chemical metal deposition | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2007-07-03 | — | — | US | disclosed |
| EP-1551851-B1 | FLUORINE-FREE METALLIC COMPLEXES FOR GAS-PHASE CHEMICAL METAL DEPOSITION | CENTRE NAT RECH SCIENT (FR) | 2006-08-02 | — | — | EP | disclosed |
| US-20060121709-A1 | Fluorine-free metallic complexes for gas-phase chemical metal deposition | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2006-06-08 | — | — | US | disclosed |
| EP-1551851-A1 | FLUORINE-FREE METALLIC COMPLEXES FOR GAS-PHASE CHEMICAL METAL DEPOSITION | Centre National De La Recherche Scientifique (FR) | 2005-07-13 | — | — | EP | disclosed |
| WO-2004029061-A1 | FLUORINE-FREE METALLIC COMPLEXES FOR GAS-PHASE CHEMICAL METAL DEPOSITION | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2004-04-08 | — | — | WO | disclosed |
| US-4609427-A | HIGH PRECISION AND RELIABILITY | CANON KABUSHIKI KAISHA (JP) | 1986-09-02 | — | — | US | disclosed |
| US-4182873-A | AMINATION OF MERCAPTO THIAZOLE OR DISULFIDE | RHONE-POULENC S.A. (FR) | 1980-01-08 | — | — | US | disclosed |
| US-3985718-A | AN OXIDIZING AGENT, A CHELATE COMPOUND, AN ELECTRON DONOR AND A CHELATING COMPLEX | RHONE-POULENC S.A. (FR) | 1976-10-12 | — | — | US | disclosed |