SCHEMBL5405963

SCHEMBL5405963

CC[C](C)C1CC2CCC1C2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.46
HSD11B1 P28845 1/20 0.45
HPGD P15428 3/20 0.40
NPC1 O15118 3/20 0.40
RAB9A P51151 3/20 0.40
MAPT P10636 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
ALDH1A1 P00352 1/20 0.40
MAPK1 P28482 1/20 0.40
GFER P55789 1/20 0.40
HSD17B10 Q99714 1/20 0.36
KCNQ3 O43525 1/20 0.36
KCNQ2 O43526 1/20 0.36
KCNQ4 P56696 1/20 0.36
KCNQ5 Q9NR82 1/20 0.36
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
GAA P10253 1/20 0.34
EPHX2 P34913 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5400134 0.80 POLB (0.47) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL3813672 0.77 POLB (0.44) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL7816335 0.77 POLB (0.53) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL19250723 0.77 POLB (0.44) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL677903 0.77 POLB (0.47) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL384169 0.77 POLB (0.47) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL13397284 0.73 POLB (0.53) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL1836060 0.73 POLB (0.53) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL14950352 0.73 POLB (0.53) POLBHSD11B1HPGDNPC1RAB9A
SCHEMBL18560093 0.73 POLB (0.53) POLBHSD11B1HPGDNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed