Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.40 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.40 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.40 |
| ▸ | KCNQ5 | Q9NR82 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | GFER | P55789 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677903 | 0.84 | POLB (0.47) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL3813672 | 0.80 | POLB (0.44) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL25832101 | 0.80 | POLB (0.53) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL13397284 | 0.80 | POLB (0.53) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL1836060 | 0.80 | POLB (0.53) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL18560093 | 0.80 | POLB (0.53) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL14950352 | 0.80 | POLB (0.53) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL5405963 | 0.77 | POLB (0.46) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL27560786 | 0.76 | POLB (0.48) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 | |
| SCHEMBL22087517 | 0.75 | POLB (0.40) | POLBHSD11B1HSD17B10KCNQ3KCNQ2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 636 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9126920-B2 | Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-08 | — | — | US | claimed |
| US-20150119597-A1 | METHOD FOR PRODUCING 2-ISOPROPYLIDENE-5-METHYL-4-HEXENYL BUTYRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-30 | — | — | US | claimed |
| EP-2202577-B1 | Chemically amplified positive resist composition and resist patterning process | SHINETSU CHEMICAL CO (JP) | 2014-08-27 | — | — | EP | claimed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | claimed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240134280-A1 | Polymer, Chemically Amplified Positive Resist Composition, Resist Patterning Process, And Mask Blank | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-25 | — | — | US | disclosed |
| US-20240118613-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-11953827-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-09 | — | — | US | disclosed |
| EP-4343433-A1 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, RESIST PATTERNING PROCESS, AND MASK BLANK | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-27 | — | — | EP | disclosed |
| CN-117736362-A | Polymer, chemically amplified positive resist composition, resist pattern forming method, and blank mask | 信越化学工业株式会社 | 2024-03-22 | — | — | CN | disclosed |
| EP-4336261-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-13 | — | — | EP | disclosed |
| US-20020102493-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020091215-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020061463-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| EP-1195390-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-10 | — | — | EP | disclosed |
| US-20020007031-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-17 | — | — | US | disclosed |
| EP-1149825-A2 | Ester compounds, polymers, resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-10-31 | — | — | EP | disclosed |
| US-5147645-A | Insecticides, miticides, nematocides | BASF AKTIENGESELLSCHAFT (DE) | 1992-09-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020007031-A1 | Novel ester compounds, polymers, resist compositions and patterning process | RER1, ARCN1, EMC1 | POLB 603/4885HSD11B1 1350/4885HSD17B10 931/4885 |
| US-20150119597-A1 | METHOD FOR PRODUCING 2-ISOPROPYLIDENE-5-METHYL-4-HEXENYL BUTYRATE | CYP8B1, HEXB, HPD | POLB 2499/4885HSD11B1 31/4885HSD17B10 14/4885 |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | ADAR, HNRNPU, POLQ | POLB 15/4885HSD11B1 4182/4885HSD17B10 4770/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.