Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.43 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.43 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.43 |
| ▸ | KAT6A | Q92794 | 2/20 | 0.37 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | NFE2L2 | Q16236 | 4/20 | 0.34 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.34 |
| ▸ | HTR6 | P50406 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | GBA1 | P04062 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5408484 | 0.87 | HCRTR2 (0.38) | KMT2AMEN1NPC1RAB9ASENP8 | |
| SCHEMBL2966142 | 0.84 | HSD11B1 (0.41) | KMT2AMEN1NPC1RAB9ASENP8 | |
| SCHEMBL548575 | 0.83 | KMT2A (0.38) | KMT2ANPC1RAB9AAKR1B1ALDH1A1 | |
| SCHEMBL5404365 | 0.83 | CNR2 (0.39) | KMT2AMEN1NPC1RAB9ASENP8 | |
| SCHEMBL5422314 | 0.83 | KAT6A (0.38) | KMT2AMEN1NPC1RAB9ASENP8 | |
| SCHEMBL5411397 | 0.81 | KAT6A (0.40) | KMT2AMEN1NPC1RAB9ASENP8 | |
| SCHEMBL5416235 | 0.80 | NPC1 (0.38) | KMT2AMEN1NPC1RAB9ASENP8 | |
| SCHEMBL455244 | 0.78 | MEN1 (0.45) | KMT2AMEN1RAB9AKAT6AALDH1A1 | |
| SCHEMBL503664 | 0.76 | CA1 (0.38) | — | |
| SCHEMBL2516869 | 0.76 | CA1 (0.49) | KMT2AMEN1NFE2L2AKR1B1HTR6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |