SCHEMBL5408484

SCHEMBL5408484

Cc1ccc([I+](OS(=O)(=O)c2ccccc2F)c2ccc(C)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCRTR2 O43614 1/20 0.38
KMT2A Q03164 3/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
MEN1 O00255 1/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37
HTR6 P50406 1/20 0.36
POLB P06746 1/20 0.35
KAT6A Q92794 1/20 0.35
TP53 P04637 1/20 0.34
EDNRA P25101 1/20 0.34
TSHR P16473 1/20 0.34
ALDH1A1 P00352 2/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5407041 0.87 KMT2A (0.43) KMT2AL3MBTL1MEN1NPC1RAB9A
SCHEMBL2966142 0.85 HSD11B1 (0.41) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL5422314 0.84 KAT6A (0.38) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL5404365 0.84 CNR2 (0.39) KMT2AL3MBTL1MEN1NPC1RAB9A
SCHEMBL5403488 0.82 HTT (0.38) KMT2AMEN1KAT6AALDH1A1
SCHEMBL5411397 0.81 KAT6A (0.40) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL2901085 0.81 MEN1 (0.41) KMT2AMEN1TSHRALDH1A1LMNA
SCHEMBL5416235 0.80 NPC1 (0.38) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL5422150 0.80 KMT2A (0.49) KMT2AMEN1POLBALDH1A1GAA
SCHEMBL2895875 0.77 VDR (0.42) KMT2AL3MBTL1MEN1RAB9ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed