Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28122669 | 0.85 | DGAT1 (0.33) | DGAT1 | |
| SCHEMBL1371142 | 0.82 | — | — | |
| SCHEMBL2712242 | 0.78 | DGAT1 (0.39) | DGAT1ALDH1A1 | |
| SCHEMBL836808 | 0.78 | DGAT1 (0.39) | DGAT1CHRM2CHRM1CHRM3ALDH1A1 | |
| SCHEMBL10774589 | 0.77 | — | — | |
| SCHEMBL10983528 | 0.77 | — | — | |
| SCHEMBL1372617 | 0.77 | — | — | |
| SCHEMBL78520 | 0.76 | DGAT1 (0.46) | DGAT1CHRM2CHRM1CHRM3ALDH1A1 | |
| SCHEMBL8398362 | 0.76 | DGAT1 (0.37) | DGAT1CHRM2CHRM1CHRM3ALDH1A1 | |
| SCHEMBL3896600 | 0.76 | DGAT1 (0.37) | DGAT1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110218177-B | Preparation method of 2, 6-dichloro-3-nitropyridine | 新发药业有限公司 | 2020-11-20 | — | — | CN | claimed |
| CN-109456257-B | Preparation method of high-yield 2-chloro-5-nitropyridine | 新发药业有限公司 | 2020-04-28 | — | — | CN | claimed |
| CN-109456257-A | A kind of preparation method of high yield 2- chloro-5-nitropyridine | 新发药业有限公司 | 2019-03-12 | — | — | CN | claimed |
| CN-104195828-B | Aqueous polymer dispersion composition and water extraction oil extracticn agent | 大金工业株式会社 | 2018-05-15 | — | — | CN | claimed |
| CN-104195828-A | AQUEOUS POLYMER DISPERSION COMPOSITION AND WATER-REPELLENT OIL-REPELLENT AGENT | DAIKIN IND LTD | 2014-12-10 | — | — | CN | claimed |
| US-11982048-B2 | Water-repellent composition | DAIKIN INDUSTRIES, LTD. (JP) | 2024-05-14 | — | — | US | disclosed |
| US-20240117177-A1 | NON-FLUORINATED BLOCK COPOLYMER | DAIKIN INDUSTRIES, LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| CN-112437783-B | Non-fluorinated block copolymers | 大金工业株式会社 | 2023-08-25 | — | — | CN | disclosed |
| CN-113227484-B | Water repellent composition | 大金工业株式会社 | 2023-08-01 | — | — | CN | disclosed |
| CN-116396451-A | Non-fluorinated block copolymers | 大金工业株式会社 | 2023-07-07 | — | — | CN | disclosed |
| EP-4177396-A1 | SURFACE TREATMENT AGENT COMPRISING A NON-FLUORINATED BLOCK COPOLYMER | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-10 | — | — | EP | disclosed |
| EP-3904588-A1 | WATER REPELLENT COMPOSITION | DAIKIN INDUSTRIES, LTD. (JP) | 2021-11-03 | — | — | EP | disclosed |
| US-6410748-B1 | Alicycli c group-containing monomer | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6291129-B1 | LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-09-18 | — | — | US | disclosed |
| EP-1031880-A1 | POSITIVE RADIATION-SENSITIVE COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2000-08-30 | — | — | EP | disclosed |
| US-6071670-A | PHOTORESIST RESIN COMPRISING PHOTOACID GENERATING COMPOUND AND AN ACID HYDROLYZABLE OLIGOMER HAVING ALICYCLIC OR POLYCONDENSED AROMATIC BACKBONE; ALKALI DEVELOPMENT WITH HIGH RESOLUTION, DRY ETCH RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-06-06 | — | — | US | disclosed |
| US-6060207-A | LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-05-09 | — | — | US | disclosed |
| US-5932391-A | CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-08-03 | — | — | US | disclosed |
| US-4259407-A | POLYMER OF HALOGENATED ALKYL ALPHA-HALOGENATED ACRYLATE | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1981-03-31 | — | — | US | disclosed |