Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR1 | O14842 | 1/20 | 0.51 |
| ▸ | CDK1 | P06493 | 1/20 | 0.51 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.51 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.51 |
| ▸ | CDK2 | P24941 | 1/20 | 0.51 |
| ▸ | CDK7 | P50613 | 1/20 | 0.51 |
| ▸ | CCNH | P51946 | 1/20 | 0.51 |
| ▸ | CCNA1 | P78396 | 1/20 | 0.51 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.51 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 1/20 | 0.44 |
| ▸ | MMP13 | P45452 | 1/20 | 0.44 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.44 |
| ▸ | PGR | P06401 | 1/20 | 0.44 |
| ▸ | AR | P10275 | 1/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5400810 | 1.00 | FFAR1 (0.51) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL5398511 | 0.97 | FFAR1 (0.53) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL5400963 | 0.92 | CA1 (0.51) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL5410201 | 0.90 | FFAR1 (0.43) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL5405422 | 0.90 | FFAR1 (0.43) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL5415249 | 0.88 | CA1 (0.43) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL3136577 | 0.87 | BCHE (0.49) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL3143580 | 0.87 | BCHE (0.49) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL3136049 | 0.87 | BCHE (0.49) | FFAR1CDK1CCNB1CCNA2CDK2 | |
| SCHEMBL3132919 | 0.87 | BCHE (0.49) | FFAR1CDK1CCNB1CCNA2CDK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-6949329-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |
| US-20030017425-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-23 | — | — | US | disclosed |