Toliodium

Toliodium

SCHEMBL5408482

Cc1ccc([I+]c2ccc(C)cc2)cc1.O=S(=O)([O-])c1ccccc1F

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.39
HCRTR2 O43614 1/20 0.39
CNR2 P34972 2/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
ALDH1A1 P00352 1/20 0.37
HSD11B1 P28845 1/20 0.36
KMT2A Q03164 2/20 0.35
KAT6A Q92794 1/20 0.35
TLR9 Q9NR96 1/20 0.35
TP53 P04637 1/20 0.35
MMP2 P08253 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
MEN1 O00255 1/20 0.35
EDNRA P25101 1/20 0.35
CYP11B1 P15538 1/20 0.34
CYP11B2 P19099 1/20 0.34
GAA P10253 1/20 0.34
PTGS2 P35354 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5407038 0.86 KAT6A (0.38) CNR2L3MBTL1ALDH1A1HSD11B1KMT2A
SCHEMBL2966140 0.84 HSD11B1 (0.43) CNR2ALDH1A1HSD11B1
SCHEMBL5404363 0.83 CNR2 (0.45) CNR2L3MBTL1KAT6A
SCHEMBL5422313 0.83 KAT6A (0.39) CNR2ALDH1A1HSD11B1KMT2AKAT6A
Toliodium SCHEMBL5403487 0.81 MAPT (0.38) POLBALDH1A1KMT2ATLR9MEN1
SCHEMBL5411395 0.81 KAT6A (0.41) CNR2ALDH1A1KMT2AKAT6AMEN1
SCHEMBL2966029 0.81 POLB (0.39) POLBHCRTR2CNR2L3MBTL1ALDH1A1
Toliodium SCHEMBL2901082 0.80 SLC22A12 (0.47) ALDH1A1HSD11B1KMT2AMEN1GAA
Toliodium SCHEMBL5422145 0.80 KMT2A (0.51) POLBALDH1A1KMT2AMMP2MEN1
SCHEMBL5416231 0.80 HSD11B1 (0.40) CNR2ALDH1A1HSD11B1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed