Toliodium

Toliodium

SCHEMBL5403487

Cc1ccc([I+]c2ccc(C)cc2)cc1.O=S(=O)([O-])c1ccc(F)cc1F

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.38
ALDH1A1 P00352 1/20 0.38
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
NFE2L2 Q16236 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PTGS2 P35354 2/20 0.36
AKR1B1 P15121 1/20 0.35
ACHE P22303 2/20 0.35
CCR2 P41597 1/20 0.35
RORC P51449 1/20 0.35
PTGS1 P23219 1/20 0.35
BCHE P06276 1/20 0.34
TLR9 Q9NR96 1/20 0.33
POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30827110 0.85 GAA (0.40) MAPTALDH1A1MEN1KMT2AHTT
SCHEMBL503803 0.85 GAA (0.40) MAPTALDH1A1MEN1KMT2AHTT
SCHEMBL4859182 0.85 LMNA (0.40) MAPTALDH1A1KMT2APTGS2AKR1B1
SCHEMBL548574 0.84 HTR2A (0.38) MAPTALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL30113133 0.84 HTR2A (0.38) MAPTALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL5403652 0.84 PSEN1 (0.36) MAPTALDH1A1SMN1; SMN2AKR1B1CCR2
SCHEMBL5406919 0.84 GAA (0.39) MAPTALDH1A1SMN1; SMN2AKR1B1CCR2
SCHEMBL5403588 0.82 CA2 (0.39) MAPTALDH1A1CCR2
SCHEMBL2964608 0.82 MAPT (0.36) MAPTALDH1A1MEN1KMT2ANFE2L2
Toliodium SCHEMBL5408482 0.81 POLB (0.39) ALDH1A1MEN1KMT2APTGS2TLR9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed