Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HTR1A | P08908 | 2/20 | 0.34 |
| ▸ | DRD2 | P14416 | 2/20 | 0.34 |
| ▸ | DRD4 | P21917 | 2/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14424144 | 0.96 | ADRA1D (0.35) | TSHRPOLBSMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL14424145 | 0.95 | ADRA1D (0.35) | TSHRPOLBSMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL501703 | 0.80 | HTR1A (0.37) | TSHRALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL5412073 | 0.79 | HTR1A (0.38) | HTR1ADRD2DRD4KCNH2 | |
| SCHEMBL501997 | 0.79 | KMT2A (0.38) | KMT2AMEN1KDM4EHTR1ADRD2 | |
| SCHEMBL14424143 | 0.77 | MEN1 (0.45) | POLBALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL502008 | 0.75 | ATM (0.41) | SMN1; SMN2ALDH1A1KMT2AMEN1PKM | |
| SCHEMBL14424122 | 0.75 | HTR1A (0.36) | HTR1ADRD2DRD4KCNH2 | |
| SCHEMBL14424136 | 0.74 | ATM (0.40) | SMN1; SMN2ALDH1A1KMT2AMEN1PKM | |
| SCHEMBL14424128 | 0.74 | PSMB8 (0.36) | HTR1ADRD2DRD4KCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7261995-B2 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-28 | — | — | US | disclosed |
| US-7261995-B2 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-28 | — | — | US | disclosed |
| US-7261995-B2 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-28 | — | — | US | disclosed |
| US-20050238993-A1 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-27 | — | — | US | disclosed |