Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8581404 | 0.84 | — | — | |
| SCHEMBL8584647 | 0.84 | — | — | |
| SCHEMBL8581708 | 0.84 | — | — | |
| SCHEMBL7005961 | 0.80 | HSD11B1 (0.34) | EPHX2PKM | |
| SCHEMBL5194001 | 0.72 | PTPN1 (0.33) | — | |
| Idramantone SCHEMBL3506706 | 0.72 | EPHX2 (0.52) | EPHX2PKM | |
| Idramantone SCHEMBL61676 | 0.72 | EPHX2 (0.52) | EPHX2PKM | |
| Idramantone SCHEMBL3506711 | 0.72 | EPHX2 (0.52) | EPHX2PKM | |
| Idramantone SCHEMBL12496961 | 0.72 | EPHX2 (0.52) | EPHX2PKM | |
| SCHEMBL5407456 | 0.67 | EPHX2 (0.34) | EPHX2PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7119156-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-10-10 | — | — | US | disclosed |
| US-7070905-B2 | Pattern forming process | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-07-04 | — | — | US | disclosed |
| US-7063932-B2 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-06-20 | — | — | US | disclosed |
| US-7029823-B2 | Resist composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-04-18 | — | — | US | disclosed |
| US-20050048400-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-03-03 | — | — | US | disclosed |
| US-20050037283-A1 | Resist resin | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20050037284-A1 | Polymer; radiation transparent pattern against short wavelengths and etching resistance; semiconductors | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20050031990-A1 | Pattern forming process | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-10 | — | — | US | disclosed |
| US-20050031991-A1 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-02-10 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1081150-A1 | 4-Oxatricyclo(4.3.1.1-3,8)undecan-5-one derivatives and process for producing the same | Daicel Chemical Industries, Ltd. (JP) | 2001-03-07 | — | — | EP | disclosed |
| EP-0497972-B1 | CHEMILUMINESCENT 3-(SUBSTITUTED ADAMANT-2'-YLIDENE) 1,2-DIOXETANES | TROPIX INC (US) | 1998-12-23 | — | — | EP | disclosed |
| US-5831102-A | HEAT RESISTANCE; STABILITY | TROPIX, INC. (US) | 1998-11-03 | — | — | US | disclosed |
| US-5543295-A | ENZYMATICALLY CLEAVABLE; ANALYZING | TROPIX, INC. (US) | 1996-08-06 | — | — | US | disclosed |
| US-5330900-A | Chemiluminescent 3-(substituted adamant-2'-ylidene) 1,2-dioxetanes | TROPIX, INC. (US) | 1994-07-19 | — | — | US | disclosed |
| US-5326882-A | High speed bioassay | TROPIX, INC. (US) | 1994-07-05 | — | — | US | disclosed |
| EP-0497972-A1 | CHEMILUMINESCENT 3-(SUBSTITUTED ADAMANT-2'-YLIDENE) 1,2-DIOXETANES | TROPIX, INC. (US) | 1992-08-12 | — | — | EP | disclosed |
| US-5112960-A | Enzyme cleavable 1,2-dioxetane compound | APPLIED BIOSYSTEMS, LLC | 1992-05-12 | — | — | US | disclosed |
| WO-1992004341-A1 | CHEMILUMINESCENT 3-(SUBSTITUTED ADAMANT-2'-YLIDENE) 1,2-DIOXETANES | TROPIX, INC. (US) | 1992-03-19 | — | — | WO | disclosed |