SCHEMBL5415072

SCHEMBL5415072

CO[Si](CCCC(C)(CCC[Si](OC)(OC)OC)CCC[Si](OC)(OC)OC)(OC)OC

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5409977 0.92 LMNA (0.36) LMNA
SCHEMBL5416153 0.90 LMNA (0.39) LMNA
SCHEMBL5418288 0.90 LMNA (0.39) LMNA
SCHEMBL15158266 0.84 LMNA (0.38) LMNA
SCHEMBL5416175 0.83 LMNA (0.31) LMNA
SCHEMBL17676423 0.80 ALDH1A1 (0.41) LMNA
SCHEMBL4436761 0.80 LMNA (0.35) LMNA
SCHEMBL17517386 0.80 LMNA (0.35) LMNA
SCHEMBL3369550 0.77 LMNA (0.36) LMNA
SCHEMBL5407043 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7205338-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-04-17 US disclosed
EP-0804060-B1 Multilayer circuit boards and processes of making the same ATOTECH DEUTSCHLAND GMBH (DE) 2006-12-13 EP disclosed
US-20040180222-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-16 US disclosed
EP-0804060-A1 Multilayer circuit boards and processes of making the same MCGEAN-ROHCO, INC. (US) 1997-10-29 EP disclosed