⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9421996 | 0.80 | — | — | |
| SCHEMBL3875955 | 0.76 | KDM4E (0.30) | — | |
| SCHEMBL25953602 | 0.73 | GAA (0.33) | — | |
| SCHEMBL14606595 | 0.67 | GLA (0.32) | — | |
| SCHEMBL31555371 | 0.67 | GAA (0.30) | — | |
| SCHEMBL4530241 | 0.67 | GAA (0.30) | — | |
| SCHEMBL19834902 | 0.67 | NOS3 (0.33) | — | |
| SCHEMBL2971407 | 0.67 | — | — | |
| SCHEMBL13766095 | 0.67 | — | — | |
| SCHEMBL12705661 | 0.67 | HTT (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117885032-A | Diamond grinding pad and preparation method thereof | 普利英(重庆)创新科技有限公司 | 2024-04-16 | — | — | CN | disclosed |
| CN-117800308-A | Preparation method and application of ammonium ferromanganese phosphate and lithium ferromanganese phosphate | 东莞东阳光科研发有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-117659762-A | High-sensitivity heat-and-humidity-resistant thermosensitive microcapsule dispersion liquid, preparation method and thermosensitive film | 南阳柯丽尔科技有限公司 | 2024-03-08 | — | — | CN | disclosed |
| CN-117004212-A | Polymer matrix composite and printed circuit board | 江西联茂电子科技有限公司 | 2023-11-07 | — | — | CN | disclosed |
| CN-117004211-A | Polymer matrix composite and printed circuit board | 江西联茂电子科技有限公司 | 2023-11-07 | — | — | CN | disclosed |
| CN-112424238-B | Resin composition | 引能仕株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-114824220-A | Negative electrode active material for nonaqueous electrolyte secondary battery, method for producing negative electrode, and nonaqueous electrolyte secondary battery | 信越化学工业株式会社 | 2022-07-29 | — | — | CN | disclosed |
| CN-112029073-A | Epoxy resin curing agent, reaction method, and curable epoxy resin composition | 株式会社艾迪科 | 2020-12-04 | — | — | CN | disclosed |
| CN-103402975-A | Beta-hydroxyalkylamide and resin composition | TOYO INK SC HOLDINGS CO LTD | 2013-11-20 | — | — | CN | disclosed |
| CN-102985971-A | Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk | HOYA CORP | 2013-03-20 | — | — | CN | disclosed |
| CN-102854744-A | Photosensitive resin composition, cured product thereof, and method for producing photosensitive resin | TOYO INK SC HOLDINGS CO LTD | 2013-01-02 | — | — | CN | disclosed |
| US-20070137675-A1 | Method for removal of flux and other residue in dense fluid systems | VERSUM MATERIALS US, LLC | 2007-06-21 | — | — | US | disclosed |
| US-7195676-B2 | Method for removal of flux and other residue in dense fluid systems | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-03-27 | — | — | US | disclosed |
| US-20060081273-A1 | Dense fluid compositions and processes using same for article treatment and residue removal | AIR PRODUCTS AND CHEMICALS, INC. | 2006-04-20 | — | — | US | disclosed |
| US-20060011217-A1 | Method for removal of flux and other residue in dense fluid systems | AIR PRODUCTS AND CHEMICALS, INC. | 2006-01-19 | — | — | US | disclosed |
| CN-1177809-C | Novel polyamino acid derivative | ֮����ʽ���� | 2004-12-01 | — | — | CN | disclosed |
| CN-1247188-A | Novel polyamino acid derivative | AJINOMOTO KK (JP) | 2000-03-15 | — | — | CN | disclosed |