Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.69 |
| ▸ | MAPT | P10636 | 2/20 | 0.69 |
| ▸ | GAA | P10253 | 2/20 | 0.69 |
| ▸ | JAK2 | O60674 | 1/20 | 0.69 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.60 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.60 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.60 |
| ▸ | DRD2 | P14416 | 1/20 | 0.50 |
| ▸ | DRD4 | P21917 | 1/20 | 0.50 |
| ▸ | DRD3 | P35462 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.49 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.49 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.49 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1-Hydroxy-2-Butoxybenzene SCHEMBL7707376 | 0.94 | LMNA (0.62) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL462067 | 0.94 | LMNA (0.67) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL270163 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL22207331 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL9048074 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL1834630 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL1836622 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL22207144 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL1834963 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 | |
| SCHEMBL6276541 | 0.92 | LMNA (0.64) | LMNAMAPTGAAJAK2CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 520 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116693727-B | Catalyst for olefin polymerization and application thereof | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-116693728-B | Solid catalyst component, preparation method thereof, olefin polymerization catalyst and application thereof | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-114467160-B | Solid electrolytic capacitor comprising polyaniline | 京瓷AVX元器件公司 | 2025-04-01 | — | — | CN | claimed |
| CN-116606390-B | Olefin polymerization catalyst and application thereof | 中国石油化工股份有限公司 | 2025-01-07 | — | — | CN | claimed |
| CN-116606391-B | Olefin polymerization catalyst solid component, preparation method thereof, olefin polymerization catalyst and application | 中国石油化工股份有限公司 | 2024-11-19 | — | — | CN | claimed |
| CN-114945632-B | Polyaniline composition, coating film, polyaniline-containing porous body, and method for producing coating film or polyaniline-containing porous body | 出光兴产株式会社 | 2024-07-12 | — | — | CN | claimed |
| CN-118280737-A | Solid electrolytic capacitor comprising polyaniline | 京瓷AVX元器件公司 | 2024-07-02 | — | — | CN | claimed |
| CN-115087675-B | Regioselectively substituted cellulose ester based negative birefringence compensation films with improved wavelength dispersion | 伊士曼化工公司 | 2024-01-19 | — | — | CN | claimed |
| US-11791106-B2 | Solid electrolytic capacitor containing polyaniline | KYOCERA AVX Components Corporation (US) | 2023-10-17 | — | — | US | claimed |
| US-11776760-B2 | Solid electrolytic capacitor containing polyaniline | KYOCERA AVX Components Corporation (US) | 2023-10-03 | — | — | US | claimed |
| US-6399817-B1 | CATALYTIC OXIDATION OF HYDROCARBON | ROHM AND HAAS COMPANY | 2002-06-04 | — | — | US | claimed |
| EP-0786699-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-10-31 | — | — | EP | claimed |
| CN-1287113-A | Process for producing (methyl) propenoic acid | ROHM & HAAS (US) | 2001-03-14 | — | — | CN | claimed |
| EP-1065197-A1 | Process for preparing (meth)acrylic acid | ROHM AND HAAS COMPANY (US) | 2001-01-03 | — | — | EP | claimed |
| CN-1269349-A | Process for producing (meth) acrylic acid | ROHM & HAAS (US) | 2000-10-11 | — | — | CN | claimed |
| EP-1035103-A2 | Process for preparing acrylic acid | ROHM AND HAAS COMPANY (US) | 2000-09-13 | — | — | EP | claimed |
| US-5683851-A | THYMOL OR ISOTHYMOL PHENOLIC RESIN, NAPHTHOQUINONEDIAZIDESULFONATE, LOW MOLECULAR WEIGHT PHENOLIC POLYHYDROXIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-11-04 | — | — | US | claimed |
| EP-0786699-A1 | Positive photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1997-07-30 | — | — | EP | claimed |
| US-5041524-A | Polyphosphazene derivatives containing carbonyl groups suitable for photoreticulation processes | CONSIGLIO NAZIONALE DELLE RICERCHE (IT) | 1991-08-20 | — | — | US | claimed |
| EP-0369398-A2 | Polyphosphazene derivatives containing carbonyl groups suitable for photoreticulation processes | CONSIGLIO NAZIONALE DELLE RICERCHE (IT) | 1990-05-23 | — | — | EP | claimed |