SCHEMBL5439366

SCHEMBL5439366

CC(c1ccc(O)c(O)c1)(c1ccc(O)c(O)c1)c1ccc2ccccc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.53
HPGD P15428 1/20 0.53
ALOX15 P16050 1/20 0.53
HSD17B10 Q99714 1/20 0.53
TDP1 Q9NUW8 1/20 0.53
ALOX5 P09917 1/20 0.53
ESR1 P03372 5/20 0.53
ESR2 Q92731 2/20 0.53
PTPN1 P18031 1/20 0.43
CYP1A2 P05177 2/20 0.42
INSR P06213 2/20 0.41
IGF1R P08069 2/20 0.41
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
HSP90AA1 P07900 1/20 0.41
RAB9A P51151 1/20 0.41
KMT2A Q03164 1/20 0.41
CASR P41180 1/20 0.41
UGT2B7 P16662 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1667167 0.87 ESR1 (0.71) TDP1ALOX5ESR1ESR2PTPN1
SCHEMBL29672349 0.83 ESR1 (0.64) ALDH1A1HPGDHSD17B10ESR1ESR2
SCHEMBL237505 0.83 ESR1 (0.64) ALDH1A1HPGDHSD17B10ESR1ESR2
SCHEMBL23861510 0.83 ESR2 (0.47) ALDH1A1HPGDALOX15HSD17B10TDP1
SCHEMBL23861356 0.82 ESR1 (0.75) ALDH1A1HPGDALOX15HSD17B10TDP1
SCHEMBL23861435 0.82 ALDH1A1 (0.70) ALDH1A1HPGDALOX15HSD17B10TDP1
SCHEMBL23861507 0.82 ESR1 (0.50) ALDH1A1HPGDHSD17B10ALOX5ESR1
SCHEMBL10839869 0.80 ESR1 (0.55) ALDH1A1TDP1ESR1ESR2PTPN1
SCHEMBL23861434 0.80 TDP1 (0.48) ALDH1A1TDP1ALOX5ESR1ESR2
SCHEMBL23861638 0.80 POLB (0.44) HSD17B10TDP1ALOX5ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
US-20070059632-A1 Method of manufacturing a semiconductor device MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2007-03-15 US disclosed
EP-1666970-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-06-07 EP disclosed