Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 4/20 | 0.53 |
| ▸ | BCHE | P06276 | 1/20 | 0.50 |
| ▸ | ACHE | P22303 | 1/20 | 0.50 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29492454 | 0.88 | TYR (0.66) | TYRBCHEACHE | |
| SCHEMBL21830428 | 0.88 | TYR (0.66) | TYRBCHEACHE | |
| SCHEMBL29492436 | 0.85 | TYR (0.50) | TYRBCHEACHE | |
| SCHEMBL21830464 | 0.85 | TYR (0.50) | TYRBCHEACHE | |
| SCHEMBL4596678 | 0.83 | TYR (0.50) | TYR | |
| SCHEMBL21830477 | 0.83 | TYR (0.48) | TYRBCHEACHEHSP90AB1 | |
| SCHEMBL29492305 | 0.83 | TYR (0.48) | TYRBCHEACHEHSP90AB1 | |
| SCHEMBL31544892 | 0.83 | LMNA (0.50) | TYRHSP90AB1 | |
| SCHEMBL21830548 | 0.81 | TYR (0.69) | TYRBCHEACHE | |
| SCHEMBL29492260 | 0.81 | TYR (0.69) | TYRBCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 166 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| EP-1614005-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-01-11 | — | — | EP | claimed |
| US-6905809-B2 | Photoresist compositions | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-14 | — | — | US | claimed |
| WO-2004088424-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| US-4500354-A | PHENOL-AMINE COMPLEXES, CHROMOGEN | GRAPHIC CONTROLS CORP. (US) | 1985-02-19 | — | — | US | claimed |
| US-12631965-B2 | Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film | ECHEM SOLUTIONS CORP. (TW) | 2026-05-19 | — | — | US | disclosed |
| US-20250376552-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362597-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250321485-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250264801-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-1046956-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | Clariant International Ltd. (CH) | 2000-10-25 | — | — | EP | disclosed |
| US-5633111-A | Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound | FUJI PHOTO FILM CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5576139-A | EXCELLENT RESOLUTION, SENSITIVITY, HEAT RESISTANCE AND DEVELOPABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| EP-0540032-B1 | Photoresist composition and etching method | FUJI PHOTO FILM CO LTD (JP) | 1996-03-06 | — | — | EP | disclosed |
| EP-0540032-A1 | Photoresist composition and etching method | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-05 | — | — | EP | disclosed |
| US-4500354-A | PHENOL-AMINE COMPLEXES, CHROMOGEN | GRAPHIC CONTROLS CORP. (US) | 1985-02-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631965-B2 | Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film | PAH, POLR1A, CBR1 | TYR 60/4885BCHE 4030/4885ACHE 4419/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.