SCHEMBL5446917

SCHEMBL5446917

CC(C)(C)OC(=O)COc1ccc(S(c2ccccc2)(c2ccccc2)S(c2ccccc2)(c2ccccc2)c2ccc(Oc3ccc(S)cc3)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 1/20 0.44
▸ PSEN1 P49768 2/20 0.43
▸ PSEN2 P49810 2/20 0.43
▸ APH1B Q8WW43 2/20 0.43
▸ NCSTN Q92542 2/20 0.43
▸ APH1A Q96BI3 2/20 0.43
▸ PSENEN Q9NZ42 2/20 0.43
▸ SMN1; SMN2 Q16637 2/20 0.42
▸ MMP13 P45452 3/20 0.40
▸ PPARA Q07869 1/20 0.40
▸ MAPT P10636 3/20 0.39
▸ NPSR1 Q6W5P4 2/20 0.39
▸ POLB P06746 2/20 0.39
▸ CYP2C9 P11712 2/20 0.39
▸ CYP2C19 P33261 2/20 0.39
▸ LMNA P02545 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ GAA P10253 1/20 0.39
▸ MMP1 P03956 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4227915 0.83 PSEN1 (0.48) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL29025764 0.82 PTPN1 (0.43) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL2448079 0.77 ALOX15 (0.57) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL8319093 0.76 PTPN1 (0.48) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL3190524 0.76 PTPN1 (0.48) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL22000631 0.75 MAPT (0.63) PTPN1SMN1; SMN2MAPTNPSR1POLB
SCHEMBL8862140 0.74 PSEN1 (0.50) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL3190513 0.74 PTPN1 (0.49) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL3197620 0.74 PSEN1 (0.50) PTPN1PSEN1PSEN2APH1BNCSTN
SCHEMBL23208280 0.74 PSEN1 (0.54) PTPN1PSEN1PSEN2APH1BNCSTN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070160929-A1 photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography SHIN-ETSU CHEMICAL CO., LTD. 2007-07-12 — — US disclosed
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