SCHEMBL29025764

SCHEMBL29025764

CC(C)(C)OC(=O)COc1ccc([SH](S)(c2ccccc2)(c2ccccc2)c2ccc(Oc3ccc(S)cc3)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 3/20 0.43
▸ PPARA Q07869 1/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.41
▸ MAPT P10636 4/20 0.39
▸ POLB P06746 3/20 0.39
▸ CYP2C9 P11712 2/20 0.39
▸ CYP2C19 P33261 2/20 0.39
▸ LMNA P02545 2/20 0.39
▸ HPGD P15428 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ PSEN1 P49768 2/20 0.38
▸ PSEN2 P49810 2/20 0.38
▸ APH1B Q8WW43 2/20 0.38
▸ NCSTN Q92542 2/20 0.38
▸ APH1A Q96BI3 2/20 0.38
▸ PSENEN Q9NZ42 2/20 0.38
▸ GLA P06280 1/20 0.38
▸ GAA P10253 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5446917 0.82 PTPN1 (0.44) PTPN1PPARASMN1; SMN2MAPTPOLB
SCHEMBL4227915 0.82 PSEN1 (0.48) PTPN1SMN1; SMN2MAPTPOLBCYP2C9
SCHEMBL22493886 0.81 PTPN1 (0.51) PTPN1SMN1; SMN2MAPTPOLBCYP2C9
SCHEMBL2448079 0.76 ALOX15 (0.57) PTPN1SMN1; SMN2MAPTPOLBCYP2C9
SCHEMBL22000631 0.74 MAPT (0.63) PTPN1SMN1; SMN2MAPTPOLBCYP2C9
SCHEMBL17652044 0.72 SMN1; SMN2 (0.64) PTPN1SMN1; SMN2MAPTLMNAPSEN1
SCHEMBL1047069 0.72 PPARA (0.56) PTPN1PPARASMN1; SMN2MAPTLMNA
SCHEMBL21895266 0.71 PTPN1 (0.51) PTPN1SMN1; SMN2MAPTPOLBCYP2C9
SCHEMBL794933 0.71 PTPN1 (0.51) PTPN1SMN1; SMN2MAPTPOLBCYP2C9
SCHEMBL8323320 0.71 PTPN1 (0.51) PTPN1SMN1; SMN2MAPTPOLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116339073-A Adhesive film forming material, pattern forming method, and adhesive film forming method 信越化学工业株式会社 2023-06-27 — — CN disclosed
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