SCHEMBL544769

SCHEMBL544769

[CH2]C(COc1ccccc1)C(C)O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.66
MTNR1A P48039 3/20 0.53
MTNR1B P49286 3/20 0.53
CYP2D6 P10635 3/20 0.53
ADRB2 P07550 1/20 0.53
ADRB1 P08588 1/20 0.53
ADRB3 P13945 1/20 0.53
MAOA P21397 1/20 0.50
PTGS1 P23219 1/20 0.50
ALOX15 P16050 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.45
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
ALDH1A1 P00352 1/20 0.44
CYP1A2 P05177 1/20 0.44
HTR1A P08908 1/20 0.44
ADRA2A P08913 1/20 0.44
DRD1 P21728 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A4 P31645 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1564414 0.81 LMNA (0.56) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL8187180 0.80 LMNA (0.70) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL28132654 0.80 LMNA (0.70) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL1618880 0.79 LMNA (1.00) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL124652 0.79 LMNA (0.63) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL96551 0.79 LMNA (0.63) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL3254859 0.79 LMNA (1.00) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL2943775 0.79 LMNA (1.00) LMNAMTNR1AMTNR1BCYP2D6ADRB2
SCHEMBL50453 0.79 LMNA (1.00) LMNAMTNR1AMTNR1BCYP2D6ADRB2
Acetic Acid SCHEMBL3252060 0.77 LMNA (0.85) LMNAMTNR1AMTNR1BCYP2D6ADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111093950-A Composition for mold material and composition set for stereolithography 麦克赛尔控股株式会社 2020-05-01 CN disclosed
EP-2362014-B1 INK JET TEXTILE PRINTING PROCESS WITH PRETREATMENT SEIKO EPSON CORP (JP) 2015-03-18 EP disclosed
US-8110617-B2 Aqueous ink composition and method of manufacturing the same SEIKO EPSON CORPORATION (JP) 2012-02-07 US disclosed
EP-2362014-A2 Pretreatment agent for ink jet textile printing and ink jet textile printing process Seiko Epson Corporation (JP) 2011-08-31 EP disclosed
US-7981947-B2 a mixture of pigments having nanostructure particle sizes and a water dispersible copolymer of acrylic acid and/or methacrylic acid and (meth)acrylic acid esters, used in ink jet printers to form prints having improved quality SEIKO EPSON CORPORATION (JP) 2011-07-19 US disclosed
US-20110166273-A1 AQUEOUS INK COMPOSITION AND METHOD OF MANUFACTURING THE SAME SEIKO EPSON CORPORATION 2011-07-07 US disclosed
US-20080146729-A1 Aqueous ink composition and method of manufacturing the same SEIKO EPSON CORPORATION 2008-06-19 US disclosed
US-20050004261-A1 Aqueous ink composition and method of manufacturing the same SEIKO EPSON CORPORATION 2005-01-06 US disclosed