Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.42 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.42 |
| ▸ | HRH1 | P35367 | 2/20 | 0.42 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.42 |
| ▸ | CX3CR1 | P49238 | 1/20 | 0.42 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.42 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 4/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | HTT | P42858 | 3/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.40 |
| ▸ | ESR1 | P03372 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19050623 | 0.92 | CHRM2 (0.40) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL19050698 | 0.90 | GAA (0.40) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL19050808 | 0.90 | SMN1; SMN2 (0.40) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| Hydrochloric Acid SCHEMBL1775375 | 0.90 | CHRM2 (0.39) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL19050694 | 0.89 | CHRM2 (0.37) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL14015976 | 0.88 | ALDH1A1 (0.40) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL19050643 | 0.88 | ALDH1A1 (0.39) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL19050616 | 0.88 | GAA (0.41) | CSNK2A1CHRM1CHRM2CHRM5CHRM3 | |
| SCHEMBL29381607 | 0.87 | TRPA1 (0.49) | CSNK2A1CHRM1GAAKMT2AHTT | |
| SCHEMBL2727885 | 0.87 | TRPA1 (0.49) | CSNK2A1CHRM1GAAKMT2AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9340707-B2 | Polishing composition to be used to polish semiconductor substrate having silicon through electrode structure, and polishing method using polishing composition | FUJIMI INCORPORATED (JP) | 2016-05-17 | — | — | US | claimed |
| US-10927262-B2 | Method for producing oxidized carbon black aqueous dispersion, and method for producing oxidized carbon black aqueous dispersion for inkjet ink | TOKAI CARBON CO., LTD. (JP) | 2021-02-23 | — | — | US | disclosed |
| US-20200131096-A1 | Biofertilizer Composition and Method of Manufacture | SUSTAINABLE COMMUNITY DEV LLC (US) | 2020-04-30 | — | — | US | disclosed |
| US-9980479-B2 | Method of reducing nematode damage | SYNGENTA CROP PROTECTION, LLC (US) | 2018-05-29 | — | — | US | disclosed |
| US-9980479-B2 | Method of reducing nematode damage | SYNGENTA CROP PROTECTION, LLC (US) | 2018-05-29 | — | — | US | disclosed |
| US-20180022926-A1 | METHOD FOR PRODUCING OXIDIZED CARBON BLACK AQUEOUS DISPERSION, AND METHOD FOR PRODUCING OXIDIZED CARBON BLACK AQUEOUS DISPERSION FOR INKJET INK | TOKAI CARBON CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| EP-3252111-A1 | METHOD FOR MANUFACTURING AQUEOUS DISPERSION OF OXIDIZED CARBON BLACK, AND METHOD FOR MANUFACTURING AQUEOUS DISPERSION OF OXIDIZED CARBON BLACK FOR INKJET INK | Tokai Carbon Co., Ltd. (JP) | 2017-12-06 | — | — | EP | disclosed |
| US-9340707-B2 | Polishing composition to be used to polish semiconductor substrate having silicon through electrode structure, and polishing method using polishing composition | FUJIMI INCORPORATED (JP) | 2016-05-17 | — | — | US | disclosed |
| EP-1715510-B2 | SUBSTRATE CLEANING LIQUID FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD | MITSUBISHI CHEM CORP (JP) | 2016-02-24 | — | — | EP | disclosed |
| US-20150111382-A1 | POLISHING COMPOSITION TO BE USED TO POLISH SEMICONDUCTOR SUBSTRATE HAVING SILICON THROUGH ELECTRODE STRUCTURE, AND POLISHING METHOD USING POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2015-04-23 | — | — | US | disclosed |
| EP-1458923-A2 | TREATMENT OF FABRIC ARTICLES | THE PROCTER & GAMBLE COMPANY (US) | 2004-09-22 | — | — | EP | disclosed |
| US-20040099290-A1 | Method for cleaning a surface of a substrate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1389496-A1 | METHOD FOR CLEANING SURFACE OF SUBSTRATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-02-18 | — | — | EP | disclosed |
| EP-1342777-A1 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030144163-A1 | Substrate surface cleaning liquid mediums and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-07-31 | — | — | US | disclosed |
| US-20030126690-A1 | Treatment of fabric articles with hydrophobic chelants | PROCTER & GAMBLE COMPANY, THE | 2003-07-10 | — | — | US | disclosed |
| WO-2003054278-A2 | TREATMENT OF FABRIC ARTICLES | THE PROCTER & GAMBLE COMPANY (US) | 2003-07-03 | — | — | WO | disclosed |
| US-6228179-B1 | CONTACTING A SEMI-CONDUCTOR SUBSTRATE WITH A SURFACE TREATMENT COMPOSITION CONTAINING A COMPLEXING AGENT AS A METAL DEPOSITION PREVENTIVE IN A LIQUID MEDIUM, IN WHICH THE COMPLEXING AGENT IS AN ETHYLENEDIAMINEPHENOL DERIVATIVE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-05-08 | — | — | US | disclosed |
| US-6143706-A | FOR CLEANING SUBSTRATES SUCH AS SEMICONDUCTORS; PREVENTS SUBSTRATE SURFACE FROM BEING CONTAMINATED WITH METAL IMPURITIES FROM THE SURFACE TREATMENT COMPOSITION AND STABLY PROVIDES CLEAN SUBSTRATE SURFACE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0858102-A2 | Surface treatment composition and method for treating surface of substrate by using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-08-12 | — | — | EP | disclosed |