Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 5/20 | 0.44 |
| ▸ | MAOA | P21397 | 2/20 | 0.44 |
| ▸ | MAOB | P27338 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.36 |
| ▸ | MMP2 | P08253 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | MIF | P14174 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | SLC5A1 | P13866 | 1/20 | 0.34 |
| ▸ | SLC5A2 | P31639 | 1/20 | 0.34 |
| ▸ | F3 | P13726 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | P4HB | P07237 | 1/20 | 0.34 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.34 |
| ▸ | XDH | P47989 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5444011 | 0.90 | ESRRG (0.41) | MAPTRAB9AMIFESR1ESR2 | |
| SCHEMBL2707109 | 0.90 | KMT2A (0.41) | MAPTMAOAMAOBRAB9APOLB | |
| SCHEMBL2706218 | 0.90 | CYP3A4 (0.41) | MAPTMAOAMAOBRAB9APOLB | |
| SCHEMBL5438375 | 0.89 | MAPT (0.44) | MAPTMAOAMAOBRAB9APOLB | |
| SCHEMBL5443936 | 0.88 | ESRRG (0.39) | MAPTMAOAMAOBRAB9APOLB | |
| SCHEMBL5435028 | 0.88 | MAOB (0.37) | MAPTMAOAMAOBRAB9AMIF | |
| SCHEMBL5452212 | 0.86 | MAPT (0.44) | MAPTMAOAMAOBRAB9APOLB | |
| SCHEMBL5441440 | 0.86 | ESR1 (0.38) | MAOBPOLBMIFESR1ESR2 | |
| 4-Vinylphenol SCHEMBL7137940 | 0.80 | MIF (0.42) | MAPTMAOAMAOBRAB9APOLB | |
| SCHEMBL1506495 | 0.79 | APP (0.42) | MAPTMAOAMAOBRAB9AMMP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-6949329-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| US-20030017425-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-23 | — | — | US | disclosed |