Dimethylamine

Dimethylamine

SCHEMBL545451

C=C(C)C(=O)OC(C)OS(=O)(=O)OCC.CNC

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.34
THRB P10828 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
N,N-Dimethylethanaminium SCHEMBL2791003 0.90 TSHR (0.33) TSHRALDH1A1THRB
SCHEMBL5906415 0.83 TSHR (0.41) TSHRALDH1A1THRB
Dimethylamine SCHEMBL8149526 0.78 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL5109130 0.78 ALDH1A1 (0.40) TSHRALDH1A1
Methylamine SCHEMBL28774217 0.77 TSHR (0.35) TSHRTHRB
SCHEMBL167768 0.74 TSHR (0.39) TSHRALDH1A1
SCHEMBL29154934 0.74 TSHR (0.38) TSHRALDH1A1THRB
Trimethylammonium SCHEMBL2791440 0.74 ALDH1A1 (0.36) TSHRALDH1A1
Dimethylamine SCHEMBL19150090 0.73 TSHR (0.40) TSHRALDH1A1THRB
Ammonia Solution, Strong SCHEMBL8368273 0.73 TSHR (0.37) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102153990-B Polishing liquid composition KAO CORP 2013-08-21 CN disclosed
US-8110013-B2 Polishing composition KAO CORPORATION (JP) 2012-02-07 US disclosed
CN-101139446-B Polishing composition KAO CORP 2011-11-16 CN disclosed
US-8012224-B2 Polishing composition KAO CORPORATION (JP) 2011-09-06 US disclosed
CN-102153990-A Polishing liquid composition KAO CORP 2011-08-17 CN disclosed
US-20110059683-A1 POLISHING COMPOSITION SUZUKI MASAHIKO 2011-03-10 US disclosed
US-20080115422-A1 Polishing composition KAO CORPORATION (JP) 2008-05-22 US disclosed
CN-101139446-A Polishing composition KAO CORP (JP) 2008-03-12 CN disclosed