Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 4/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | HPGD | P15428 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | BLM | P54132 | 2/20 | 0.50 |
| ▸ | USP2 | O75604 | 2/20 | 0.50 |
| ▸ | HTT | P42858 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.50 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.50 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.50 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.50 |
| ▸ | IDO1 | P14902 | 1/20 | 0.50 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.50 |
| ▸ | CASP1 | P29466 | 1/20 | 0.50 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13074723 | 0.83 | EGFR (0.46) | ALOX15HIF1AMEN1HPGDKMT2A | |
| SCHEMBL935118 | 0.81 | POLB (0.49) | ALOX15HPGDLMNAMAPTBLM | |
| SCHEMBL545256 | 0.81 | HTT (0.48) | ALOX15MEN1HPGDKMT2ALMNA | |
| SCHEMBL10883741 | 0.79 | GAA (0.54) | HIF1AMEN1HPGDKMT2ALMNA | |
| Hydrochloric Acid SCHEMBL934885 | 0.79 | HTT (0.47) | ALOX15MEN1HPGDKMT2ALMNA | |
| SCHEMBL23629772 | 0.79 | HTT (0.47) | ALOX15MEN1HPGDKMT2ALMNA | |
| SCHEMBL935095 | 0.79 | HTT (0.47) | ALOX15MEN1HPGDKMT2ALMNA | |
| SCHEMBL935494 | 0.79 | POLB (0.48) | ALOX15HPGDLMNAMAPTBLM | |
| SCHEMBL935126 | 0.79 | HTT (0.47) | ALOX15MEN1HPGDKMT2ALMNA | |
| Hydrochloric Acid SCHEMBL2794700 | 0.78 | HTT (0.46) | ALOX15MEN1HPGDKMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0858102-B1 | Surface treatment composition and method for treating surface of substrate by using the same | MITSUBISHI CHEM CORP (JP) | 2007-07-25 | — | — | EP | claimed |
| EP-1715510-B2 | SUBSTRATE CLEANING LIQUID FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD | MITSUBISHI CHEM CORP (JP) | 2016-02-24 | — | — | EP | disclosed |
| US-8110534-B2 | Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-02-07 | — | — | US | disclosed |
| EP-1715510-B1 | SUBSTRATE CLEANING LIQUID FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD | MITSUBISHI CHEM CORP (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-20100167972-A1 | CLEANING SOLUTION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING SUBSTRATE FOR SEMICONDUCTOR DEVICE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| EP-1342777-B9 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEM CORP (JP) | 2010-02-17 | — | — | EP | disclosed |
| US-7621281-B2 | Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-11-24 | — | — | US | disclosed |
| EP-1342777-B1 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEM CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-20080011321-A1 | Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| EP-0858102-B1 | Surface treatment composition and method for treating surface of substrate by using the same | MITSUBISHI CHEM CORP (JP) | 2007-07-25 | — | — | EP | disclosed |
| EP-1715510-A1 | SUBSTRATE CLEANING LIQUID FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD | Mitsubishi Chemical Corporation (JP) | 2006-10-25 | — | — | EP | disclosed |
| US-6896744-B2 | Method for cleaning a surface of a substrate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2005-05-24 | — | — | US | disclosed |
| US-20050020463-A1 | Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2005-01-27 | — | — | US | disclosed |
| US-20040099290-A1 | Method for cleaning a surface of a substrate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1389496-A1 | METHOD FOR CLEANING SURFACE OF SUBSTRATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-02-18 | — | — | EP | disclosed |
| EP-1342777-A1 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030144163-A1 | Substrate surface cleaning liquid mediums and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-07-31 | — | — | US | disclosed |
| US-6228179-B1 | CONTACTING A SEMI-CONDUCTOR SUBSTRATE WITH A SURFACE TREATMENT COMPOSITION CONTAINING A COMPLEXING AGENT AS A METAL DEPOSITION PREVENTIVE IN A LIQUID MEDIUM, IN WHICH THE COMPLEXING AGENT IS AN ETHYLENEDIAMINEPHENOL DERIVATIVE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-05-08 | — | — | US | disclosed |
| US-6143706-A | FOR CLEANING SUBSTRATES SUCH AS SEMICONDUCTORS; PREVENTS SUBSTRATE SURFACE FROM BEING CONTAMINATED WITH METAL IMPURITIES FROM THE SURFACE TREATMENT COMPOSITION AND STABLY PROVIDES CLEAN SUBSTRATE SURFACE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0858102-A2 | Surface treatment composition and method for treating surface of substrate by using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-08-12 | — | — | EP | disclosed |